Picture of Diffusion furnace, A3 oxidation
Current status:
AVAILABLE
Book | Log
Show/Collapse all

You must be logged in to view files.

Centrotherm E1200 HT 260-4 1D 01 Diffusion furnace A-stack is used to process IC-clean silicon wafers either with reactive or inert gases. The main processes are dry and wet oxidation, diffusion, and annealing.

Tool name:
Diffusion furnace, A3 oxidation
Area/room:
M1 D Diffusion
Category:
Furnace Processes
Manufacturer:
Centrotherm
Model:
E1200 HT 260-4

Instructors

Licensed Users

You must be logged in to view tool modes.