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View
| CVD Furnace | 2L1020 10 | Furnace Processes | Ramesh Raju | | MTI Corporation | OTF-1200X | | Optoelectronics Group |
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View
| Mechanical testing system MTS | 2L1155 01 | Characterization | Glenn Ross | Elmeri Österlund | MTS | NN | | Electronics Integration and Reliability |
|
View
| 240 LED lamp | 2L4197 01 | Characterization | Marko Yli-Koski | Ville Vähänissi | Cree | Cree Edge High Output | | Electron Physics Group |
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View
| 2D Heterostructure Transfer System | 2F13 18 | Other processes | Faisal Ahmed | MD Gius Uddin | HQ Graphene | NN | | Photonics Group |
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View
| AFM DI3100 | 1F13 01 | Characterization | Markku Kainlauri | | DI | Dimension 3100 | | Microelectronic Systems |
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View
| AFM Dimension Icon | 2L4168 03 | Characterization | Ramesh Raju | Yifan Zhou | Bruker | Dimension Icon | | Aalto Nanofab |
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View
| AFM NT-MDT Ntegra | 2L4168 01 | Characterization | Camilla Tossi | Jori Lemettinen | Ntegra | NT-MDT Ntegra AFM | | Aalto Nanofab |
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View
| Aiolos Probing Station | 1F06 10 | Characterization | Tomi Hassinen | | Afore | A | | VTT Nanofabrication Centre |
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View
| Air Plasma Treater | 2L1020 ?? | Other processes | Sami Suihkonen | | nn | nn | | Aalto Nanofab |
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View
| ALD Reactor ALD-1 | 2F09 11 | CVD & ALD | Edgar A. Maiorov | Heli Seppänen | Beneq | Beneq TFS-500 | | Aalto Nanofab |
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View
| ALD Reactor ALD-2 | 2F09 09 | CVD & ALD | Edgar A. Maiorov | Ismo Heikkinen | Beneq | Beneq TFS-500 | | Aalto Nanofab |
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View
| ALD Reactor ALD-3 | 2F09 07 | CVD & ALD | Edgar A. Maiorov | | Picosun | SUNALE R-200 Advanced | | Aalto Nanofab |
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View
| ALD reactor SUNALE R-150B | 1B 12 | CVD & ALD | Oili Ylivaara | | Picosun | SUNALE R-150B | | Microelectronic Systems |
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View
| Alignment verification system DSM8 | 1J 04 | Characterization | Sami Ylinen | | Süss Microtech | DSM8 | | Microelectronic Systems |
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View
| AlN Sputtering System | 1E 04 | Sputtering | Stefan Mertin | | AMS | SMT2004 | | Microelectronic Systems |
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View
| Aluminium Etch | 2F12 26 | Wet Processes | Päivikki Repo | Ville Vähänissi | PM Plast | NN | | Aalto Nanofab |
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View
| Annealing | 2F07 04A | Annealing | Päivikki Repo | Ville Vähänissi | Centrotherm | Centrotherm | | Aalto Nanofab |
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View
| Annealing furnace PEO-603 | 1F04 13 | Annealing | Antti Tolkki | | ATV | PEO-603 | | Microelectronic Systems |
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View
| Anodization Cell | 1H05 02 | Other processes | Leif Grönberg | | Protoshop | . | | Microelectronic Systems |
|
View
| ASM LPCVD Nitride | 1D 21-1 | CVD & ALD | Mikko Järvi | | ASM | DUO A400 | 120 | VTT Nanofabrication Centre |
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View
| ASM LPCVD Poly | 1D 22-1 | CVD & ALD | Mikko Järvi | | ASM | DUO A400 | 120 | VTT Nanofabrication Centre |
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View
| ASM LPCVD TEOS | 1D 21-2 | CVD & ALD | Mikko Järvi | | ASM | DUO A400 | 120 | VTT Nanofabrication Centre |
|
View
| ATV furnace Mörkö | 2F10 16 | Furnace Processes | Joonas Heikkinen | | ATV | PEO-604 | 697 | Microfabrication Group |
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View
| Au plating module | 1F05 06 | Electrochemical Deposition | Jaana Marles | | PM Plast | Au | | Microelectronic Systems |
|
View
| Black Magic | 2L1018 04 | Epitaxial Growth | Petri Mustonen | Ramesh Raju | NN | NN | | Optoelectronics Group |
|
View
| Bond Aligner | 1J 09 | Wafer Bonding | Feng Gao | | EVG | EVG 610 | | Microelectronic Systems |
|
View
| Bond aligner EVG620 | 1E 17 | Wafer Bonding | Panu Pekko | | Electronic Vision | EVG620 | | Microelectronic Systems |
|
View
| Cassette washing machine | 1H04 01 | Other processes | Harri Ilmari | | Miele | . | | Microelectronic Systems |
|
View
| CD MT3000 | 1A 24 | Characterization | Olga Mihailichenco | Jussi Sarkkinen | MueTec | MT3000 | | VTT Nanofabrication Centre |
|
View
| Cleanroom A | M2A | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
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View
| Cleanroom B | M2B | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
|
View
| Cleanroom C | M2C | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
|
View
| Cleanroom D | M2D | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
|
View
| Cleanroom E | M2E | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Physical Characteristics of Surfaces and Interface |
|
View
| Cleanroom F | M2F | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
|
View
| Cleanroom G | M2G | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
|
View
| Cleanroom H | M2H | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
|
View
| Cleanroom I | M2I | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
|
View
| Cleanroom J | M2J | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
|
View
| Cleanroom K | M2K | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
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View
| Cleanroom L | M2L | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
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View
| CMP 6DSSP | 1ST 04 | Back-end Processes | Jaakko Salonen | | Strasbaugh | 6DSSP | | Microelectronic Systems |
|
View
| CMP Strasbaugh 6EC | 1MC 01 | Back-end Processes | Jaakko Salonen | | Strasbaugh | 6EC | | Microelectronic Systems |
|
View
| CO2-dryer BalTec CPD408 | 1C 02 | Other processes | Jaakko Saarilahti | | BalTec | CPD 408 | | Microelectronic Systems |
|
View
| Coater Developer EVG120 | 1A 25 | Lithography | Olga Mihailichenco | Pasi Haapasalo | EVG | EVG120 | 711 | Microelectronic Systems |
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View
| Contact Angle Meter THETA | 2F13 10 | Characterization | Ville Jokinen | Joonas Heikkinen | Biolin Scientifics | nn | 43 | Aalto Nanofab |
|
View
| DCA Sputtering System | 1F04 03 | Sputtering | Stefan Mertin | | DCA Instruments | DCA M450 | | Microelectronic Systems |
|
View
| Developer Spinner LabSpin | 2F08 28 | Lithography | Nikhilendu Tiwary | | Süss | LabSpin6 | | Aalto Nanofab |
|
View
| Developer track Convac | 1A 03 | Lithography | Olga Mihailichenco | Pasi Haapasalo | Convac | M6000 | | Microelectronic Systems |
|
View
| Dicing Saw DFD6341 | 1MP 19 | Back-end Processes | Harri Pohjonen | Jaana Marles | Disco | DFD6341 | | Microelectronic Systems |
|
View
| Dicing saw Disco | 1MP 01 | Back-end Processes | Harri Pohjonen | | Disco | DFD651 | | Microelectronic Systems |
|
View
| Die Sorter IC 1200 | 1MP 18 | Other processes | Giovanni Delrosso | | Infotech | IC 1200 | | VTT Nanofabrication Centre |
|
View
| Diffusion furnace, A1 anneal | 1D 01_A1 | Furnace Processes | Mikko Järvi | Antti Tolkki | Centrotherm | E1200 HT 260-4 | | Microelectronic Systems |
|
View
| Diffusion furnace, A2 oxidation | 1D 01_A2 | Furnace Processes | Mikko Järvi | Antti Tolkki | Centrotherm | E1200 HT 260-4 | | Microelectronic Systems |
|
View
| Diffusion furnace, A3 oxidation | 1D 01_A3 | Furnace Processes | Mikko Järvi | Antti Tolkki | Centrotherm | E1200 HT 260-4 | | Microelectronic Systems |
|
View
| Diffusion furnace, A4 oxidation | 1D 01_A4 | Furnace Processes | Mikko Järvi | Antti Tolkki | Centrotherm | E1200 HT 260-4 | | Microelectronic Systems |
|
View
| Disco DADdy - Dicing saw | 2L1019 41 | Back-end Processes | Matti Hokkanen | | Disco | DAD3220 | | Aalto Nanofab |
|
View
| DLTS | 2L4142 06 | Characterization | Ville Vähänissi | Marko Yli-Koski | Semilab | DLS-83D | | Electron Physics Group |
|
View
| Dual Spin Rinse Drier 16 and 17 | 1F05 23 | Wet Processes | Harri Ilmari | | Rhetech/Semitool | SRD 8300 S | | Microelectronic Systems |
|
View
| Dual SRD 14 (150mm) and 15 (200 mm) | 1G 12 | Wet Processes | Liisa Valkonen | | Goldfinger/Verteq | Superclean 1800-6 | | Microelectronic Systems |
|
View
| Dual SRD 3 (100 mm) and 4 (150 mm) | 1C 06 | Wet Processes | Kirsi Järvi | | Semitool | SRD 880S | | Microelectronic Systems |
|
View
| Dual SRD 6 (150 mm) and 10 (200mm) | 1D 11 | Wet Processes | Leena Nurminen | | Semitool | SRD 880S | | Microelectronic Systems |
|
View
| Dual SRD 7 (100 mm) and 8 (150 mm) | 1D 06 | Wet Processes | Leena Nurminen | | Rhetech/Semitool | SRD 87S61 | | Microelectronic Systems |
|
View
| EBL Pattern Generator | 2F13 07B | Lithography | Joonas Peltonen | | Raith GMBH | NN | | Aalto Nanofab |
|
View
| EBL Vistec | 2F03 01 | Lithography | Joonas Peltonen | | Vistec | EPBG5000pES | | Aalto Nanofab |
|
View
| Electrochemical Etching Cell | 1C 14 | Wet Processes | Kestutis Grigoras | | AMMT | MPSB200 | | Microelectronic Systems |
|
View
| Electroplating Cu | 2L1019 30 | Electrochemical Deposition | Glenn Ross | | NB Technologies | NN | | Aalto Nanofab |
|
View
| Electroplating Ni | 2L1019 32 | Electrochemical Deposition | Glenn Ross | | NB Technologies | NN | | Aalto Nanofab |
|
View
| Electroplating Sn | 2L1019 31 | Electrochemical Deposition | Glenn Ross | | NB Technologies | NN | | Aalto Nanofab |
|
View
| Electrostatic Carrier | 1WC 10 | Other processes | Jukka Pihlainen | | Protec | PT3000 | | Microelectronic Systems |
|
View
| Ellipsometer Plasmos | 2F09 04 | Characterization | Victor Ovchinnikov | Ville Vähänissi | Plasmos | Plasmos SD2300 | | Aalto Nanofab |
|
View
| Evaporator e-gun Edwards | 2L1019 02 | Evaporation | Tomi Koskinen | Ivan Radevici | Edwards | Edwards E306A | | Aalto Nanofab |
|
View
| Evaporator e-gun Varian | 2L1019 01 | Evaporation | Matti Hokkanen | | Varian | Varian (B 'n B) | | Aalto Nanofab |
|
View
| Evaporator LISA | 2S09 02 | Evaporation | Rishabh Upadhyay | Giacomo Catto | Instrumentti Mattila | IM-9912 | | PICO |
|
View
| Evaporator MASA | 2S09 01 | Evaporation | Xueyin BAI | WEI LIU | MASA | IM-9912 | | Aalto Nanofab |
|
View
| FIB Helios /SEM/EDX | 2F13 04 | Nanostructuring | Antti Peltonen | | FEI | Helios Nanolab600 | | Aalto Nanofab |
|
View
| Field emission SEM | 2L4142 10 | Characterization | Vesa Vuorinen | | JEOL | JSM-6335F | 404 | Electronic reliability and integration |
|
View
| Film stress measurement tool | 1F01 07 | Characterization | Oili Ylivaara | | Toho Technology | FLX 2320-S | | Microelectronic Systems |
|
View
| Flash Light | 2F13 16B | Characterization | Marko Yli-Koski | | Hensel | EHT 3000 Focus + TRIA 3000 S | | Electron Physics Group |
|
View
| Flatness meter ADE | 1ST 03 | Characterization | Jaakko Salonen | | ADE | 9500 Ultra Gage | | Microelectronic Systems |
|
View
| Flip-chip bonder B | 1F01 04 | Back-end Processes | Harri Pohjonen | | SET | FC150/1998 | | Microelectronic Systems |
|
View
| Four Point Probe Old | 2F11 12 | Characterization | Antti Peltonen | | NN | NN | | Aalto Nanofab |
|
View
| Four-point Probe Loresta | 1F06 03 | Characterization | Tomi Hassinen | | Loresta AP | . | | Microelectronic Systems |
|
View
| Fume Hood HF etch | 2F12 20 | Wet Processes | Päivikki Repo | Ville Vähänissi | PMPlast | 1900-710 | | Aalto Nanofab |
|
View
| Fume hood Metal etch | 2F12 12 | Wet Processes | Päivikki Repo | | PMPlast | NN | | Aalto Nanofab |
|
View
| Fume Hood TMAH | 2F12 10 | Wet Processes | Päivikki Repo | | PMPlast | NN | | Aalto Nanofab |
|
View
| Fume Hood A | 2F07 02 | Wet Processes | Ville Vähänissi | Marko Yli-Koski | PMplast | PMPlast | | Electron Physics Group |
|
View
| Fume Hood Acid work | 2L1019 36 | Wet Processes | Päivikki Repo | | Visu | Aalto | | Aalto Nanofab |
|
View
| Fume Hood Acid work 1 | 2F12 16 | Wet Processes | Päivikki Repo | | PMPlast | NN | | Aalto Nanofab |
|
View
| Fume Hood Acid work 2 | 2F12 19 | Wet Processes | Päivikki Repo | | PMPlast | Acids | | Aalto Nanofab |
|
View
| Fume Hood ALD | 2F09 01 | Wet Processes | Ville Vähänissi | | PMPlast | PMPlast | | Aalto Nanofab |
|
View
| Fume Hood Cu Contamination | 2F11 09 | Wet Processes | Marko Yli-Koski | Hele Savin | PMPlast | Spinner | | Aalto Nanofab |
|
View
| Fume Hood Electroplating | 2L1019 33 | Wet Processes | Glenn Ross | | NB Technologies | NN | | Aalto Nanofab |
|
View
| Fume Hood KOH | 2L1019 37 | Wet Processes | Päivikki Repo | | Visu | Aalto | | Aalto Nanofab |
|
View
| Fume Hood Lift off | 2F12 18 | Wet Processes | Päivikki Repo | | PM Plast | Type no 2580-1 | | Aalto Nanofab |
|
View
| Fume Hood Lithography | 2L1019 34 | Wet Processes | Päivikki Repo | | Visu | Aalto | | Aalto Nanofab |
|
View
| Fume Hood Salo | 2S10 01 | Wet Processes | Juha Lievonen | | NN | NN | | Aalto Nanofab |
|
View
| Fume Hood Solvents | 2F12 05 | Wet Processes | Päivikki Repo | | PMPlast | Fume Hood | | Aalto Nanofab |
|
View
| Fume Hood Solvents | 2L1019 35 | Wet Processes | Päivikki Repo | | Visu | Aalto | | Aalto Nanofab |
|
View
| Fume Hood Spinner | 2S11 01 | Wet Processes | Joonas Peltonen | | PMPlast | Photoresist | | Aalto Nanofab |
|
View
| Fumehood | 1TF 03 | Wet Processes | Tapio Mäkelä | | . | . | | Microelectronic Systems |
|
View
| Fumehood | 1TF 04 | Wet Processes | Tapio Mäkelä | | . | . | | Microelectronic Systems |
|
View
| Fumehood ACID | 1C 21 | Wet Processes | Harri Ilmari | | Lotus | . | | Microelectronic Systems |
|
View
| Fumehood BOAT CLEAN | 1C 22 | Wet Processes | Harri Ilmari | | Lotus | Boat Clean | | Microelectronic Systems |
|
View
| Fumehood DEVELOP | 1A 21 | Wet Processes | Harri Ilmari | | Lotus | - | | Microelectronic Systems |
|
View
| Fumehood for anodization | 1H05 03 | Wet Processes | Leif Grönberg | | . | . | | Microelectronic Systems |
|
View
| Fumehood IMPLANT | 1ST 09 | Wet Processes | Pekka Ikonen | | Lotus | . | | Microelectronic Systems |
|
View
| Fumehood KULTA | 1F05 16 | Wet Processes | Jaana Marles | | Semitool | . | | Microelectronic Systems |
|
View
| Fumehood LIFT-OFF | 1WC 03 | Wet Processes | Harri Ilmari | | Stangl | . | | Microelectronic Systems |
|
View
| Fumehood LITHO 1 | 1F03 16 | Lithography | Jaana Marles | | Lotus | - | | Microelectronic Systems |
|
View
| Fumehood MASK CLEAN | 1C 09 | Wet Processes | Harri Ilmari | | Lotus | . | | Microelectronic Systems |
|
View
| Fumehood PLATING | 1F05 22 | Electrochemical Deposition | Jaana Marles | | Lotus | . | | Microelectronic Systems |
|
View
| Fumehood RELEASE IPA | 1G 30 | Wet Processes | Jaana Marles | | Lotus | . | | Microelectronic Systems |
|
View
| Fumehood SCALE&CUT | 1S01 01 | Wet Processes | Mervi Vehviläinen | | Amsel | . | | Microelectronic Systems |
|
View
| Fumehood SERVICE ACIDS | 1WC 01 | Wet Processes | Harri Ilmari | | Amsel | . | | Microelectronic Systems |
|
View
| Fumehood SERVICE SOLVENTS | 1WC 02 | Wet Processes | Harri Ilmari | | PMPlast | . | | Microelectronic Systems |
|
View
| Fumehood solvents for cleaning parts | 1H06 01 | Wet Processes | Jukka Huhtala | | PM Plast | . | | Microelectronic Systems |
|
View
| Fumehood TMAH | 1C 17 | Wet Processes | Harri Ilmari | | Lotus | . | | Microelectronic Systems |
|
View
| Fumehood VESSEL | 1F02 05 | Wet Processes | Harri Ilmari | | Stangl | . | | Microelectronic Systems |
|
View
| Fumehood WET SERVICE | 1H04 02 | Wet Processes | Harri Ilmari | | Lotus | WS | | Microelectronic Systems |
|
View
| Furnace MiniBrute Lower | 2L1020 02B | Furnace Processes | Victor Ovchinnikov | | Thermco | MiniBrute | | Physical Characteristics of Surfaces and Interface |
|
View
| Furnace MiniBrute Upper | 2L1020 02A | Furnace Processes | Victor Ovchinnikov | | Mini-Brute | Mini-Brute | | Aalto Nanofab |
|
View
| Furnace PEO | 2F12 08 | Furnace Processes | Victor Ovchinnikov | | PEO | PEO-601/ATV | | Aalto Nanofab |
|
View
| Glove Box ALD old | 2EC 05 | Other processes | Ville Vähänissi | | NN | NN | | Aalto Nanofab |
|
View
| Glovebox ALD Precursors | 2EC 04 | CVD & ALD | Ville Vähänissi | | Innovative Technology | PureLab HE 21 | | Micro and Quantum Systems |
|
View
| Goniometer | 1WC 04 | Characterization | Sami Vähänen | | Unknown | Unknown | | Microelectronic Systems |
|
View
| Hall Measurement System Ecopia | L24166 01 | Characterization | Ramesh Raju | Sami Suihkonen | Ecopia | HMS500 | | Optoelectronics Group |
|
View
| Halogen lamp | 2L4196 05 | Characterization | Marko Yli-Koski | Michael Dov Serué | OSRAM | AluPAR 64 NSP | | Electron Physics Group |
|
View
| Heating Bath IKA | 2F12 22 | Wet Processes | Jorden Senior | | IKA | HBR 4 | | PICO |
|
View
| HF vapor etcher MEMS-CET | 1B 13 | Dry etching | Mikko Järvi | | Primaxx | MEMS-CET | | Microelectronic Systems |
|
View
| HMDS Desiccator | 2F08 21 | Lithography | Päivikki Repo | | nn | nn | | Aalto Nanofab |
|
View
| Hot Plate | 2F03 06 | Lithography | Joonas Peltonen | Antti Peltonen | NN | NN | | Nanomagnetism and Spintronics Group |
|
View
| Hot plate - Tmax 250C | 2L4197 02 | Characterization | Marko Yli-Koski | Ville Vähänissi | Stuart | SB-500 | | Electron Physics Group |
|
View
| Hot plate - Tmax 250C | 2L4196 07 | Characterization | Marko Yli-Koski | Ville Vähänissi | Stuart | SB-500 | | Electron Physics Group |
|
View
| Hot plate - Tmax 350C | 2L4196 08 | Characterization | Marko Yli-Koski | Ville Vähänissi | IKA | C-MAG HS10 | | Electron Physics Group |
|
View
| Hot plate BLE | 1A 18 | Lithography | Olga Mihailichenco | | BLE | BLE | | Microelectronic Systems |
|
View
| Hot plate duo | 1A 29B | Lithography | Olga Mihailichenco | Pasi Haapasalo | Sawatec | HP-200 | | VTT Nanofabrication Centre |
|
View
| Hot Plate Matti | 2L1019 15 | Lithography | Ville Jokinen | | Präzitherm | Hot plate | | Aalto Nanofab |
|
View
| Hot Plate Mervi | 2F08 20 | Lithography | Ville Jokinen | Päivikki Repo | UniTemp GmbH | HP-220 | | Aalto Nanofab |
|
View
| Hot Plate Pia | 2F08 19 | Annealing | Päivikki Repo | | UniTemp GmbH | HP-220 | | Aalto Nanofab |
|
View
| Hotplate OPTIHOT HB20 | 1G 09 | Lithography | Pasi Haapasalo | | ATM | OPTIhot HB20 | | Microelectronic Systems |
|
View
| Hotplate small | 1F03 09 | Lithography | Pasi Haapasalo | | Hamatech | Unknown | | Microelectronic Systems |
|
View
| ICP-RIE Plasmalab 100 | 2F09 12 | Dry etching | Toni Pasanen | Christoffer Joonas Kauppinen | Oxford Instruments | Oxford Instruments Plasmalab System100 - ICP 180 | | Aalto Nanofab |
|
View
| Impedance Analyzer | 1F06 09 | Characterization | Tomi Hassinen | | Agilent | 4294A | | Microelectronic Systems |
|
View
| In plating module | 1F05 04 | Electrochemical Deposition | Jaana Marles | | PM Plast | In | | Microelectronic Systems |
|
View
| Ion Beam Etcher | 2F11 13 | Dry etching | Victor Ovchinnikov | | Meyer Burger | IonSys 500 | | Aalto Nanofab |
|
View
| Ion Beam Trimmer | 1E 15 | Dry etching | Jaakko Salonen | | AMSystems | ? | | Microelectronic Systems |
|
View
| Ion Implanter Eaton | 2F10 10 | Ion Implantation | Victor Ovchinnikov | | EATON | EATON NV-3206 | | Aalto Nanofab |
|
View
| Ion implanter Eaton 8200 | 1ST 08 | Ion Implantation | Antti Tolkki | | Eaton | NV8200 | | Microelectronic Systems |
|
View
| IR-Inspector | 1J 13 | Characterization | Antti Tolkki | Panu Pekko | Schott Moritex | - | | Microelectronic Systems |
|
View
| KOH setup | 2L1019 08 | Wet Processes | Päivikki Repo | Gianmario Scotti | NN | NN | | Microfabrication Group |
|
View
| Lab 4142 N1 | 2L4142_1 | Other processes | Joonas Peltonen | Ville Vähänissi | NN | NN | | Aalto Nanofab |
|
View
| Lab 4142 N2 | 2L4142_2 | Other processes | Joonas Peltonen | Ville Vähänissi | NN | NN | | Aalto Nanofab |
|
View
| Lab 4142 N3 | 2L4142_3 | Other processes | Joonas Peltonen | Ville Vähänissi | NN | NN | | Aalto Nanofab |
|
View
| Lab 4142 N4 | 2L4142_4 | Other processes | Joonas Peltonen | Ville Vähänissi | NN | NN | | Aalto Nanofab |
|
View
| Lab 4165 | 2L4165 | Other processes | Lassi Hällström | | NN | NN | | Aalto Nanofab |
|
View
| Lab 4166 A | 2L4166A | Other processes | Ramesh Raju | | NN | NN | | Aalto Nanofab |
|
View
| Lab 4166 B | 2L4166B | Other processes | Ramesh Raju | | NN | NN | | Aalto Nanofab |
|
View
| Lab 4168 A | 2L4168_A | Other processes | Ramesh Raju | | NN | NN | | Aalto Nanofab |
|
View
| Lab 4168 B | 2L4168_B | Other processes | Ramesh Raju | | NN | NN | | Aalto Nanofab |
|
View
| Lab 4169 A | 2L4169A | Other processes | Päivikki Repo | | NN | NN | | Aalto Nanofab |
|
View
| Lab 4169 B | 2L4169B | Other processes | Päivikki Repo | | NN | NN | | Aalto Nanofab |
|
View
| Lab 4196 | 2L4196 | Other processes | Ville Vähänissi | | NN | NN | | Aalto Nanofab |
|
View
| Lab 4197 | 2L4197 | Other processes | Ville Vähänissi | | NN | NN | | Aalto Nanofab |
|
View
| Laser marking station Trumpf | 1OC 02 | Other processes | Antti Tolkki | | Trumpf | TruMark Station 5000 | | VTT Nanofabrication Centre |
|
View
| Laser Micromachining System | 2L1020 07 | Other processes | Edgar A. Maiorov | | Azpect / Newport | na | | Aalto Nanofab |
|
View
| Laser Wafer Marker | 2L1019 29 | Other processes | Joonas Isometsä | Ismo Heikkinen | Cencorp | 300 LM | | Electron Physics Group |
|
View
| Laserwriter | 2F08 03 | Lithography | Antti Peltonen | | Microtech | LW 405 | | Aalto Nanofab |
|
View
| Lifetime Scanner PV-2000 | 2F13 11 | Characterization | Ville Vähänissi | Marko Yli-Koski | Semilab | PV-2000A | | Electron Physics Group |
|
View
| Linear Corona Charger | 2F13 16 | Characterization | Ville Vähänissi | Marko Yli-Koski | Semilab | LCC-300 | | Electron Physics Group |
|
View
| Logitech PM6 Lapping system | 2L1019 42 | Other processes | Jani Pöllänen | Vesa Vuorinen | Logitech | PM6 | | Electronics Integration and Reliability |
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View
| LPCVD furnace, B1 LTO | 1D 02_B1 | Furnace Processes | Mikko Järvi | Antti Tolkki | Centrotherm | E1200 HT 260-4 | | Microelectronic Systems |
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View
| LPCVD furnace, B2 TEOS | 1D 02_B2 | Furnace Processes | Mikko Järvi | Antti Tolkki | Centrotherm | E1200 HT 260-4 | | Microelectronic Systems |
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View
| LPCVD furnace, B3 POLY | 1D 02_B3 | Furnace Processes | Mikko Järvi | Antti Tolkki | Centrotherm | E1200 HT 260-4 | | Microelectronic Systems |
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View
| LPCVD furnace, B4 Nitride | 1D 02_B4 | Furnace Processes | Mikko Järvi | Antti Tolkki | Centrotherm | E1200 HT 260-4 | | Microelectronic Systems |
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View
| LPCVD PolySi | 2F07 04C | CVD & ALD | Antti Peltonen | Tapani Vehmas | Centrotherm | Centrotherm | | Aalto Nanofab |
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View
| LPCVD SiN | 2F07 04B | CVD & ALD | Pekka Törmä | | Centrotherm | Centrotherm | | Aalto Nanofab |
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View
| Manual prober | 1F06 02 | Characterization | Tomi Hassinen | | Rucker&Kolls | . | | Microelectronic Systems |
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View
| Manual spinner apogee | 1F03 28 | Back-end Processes | Jaana Marles | Pasi Haapasalo | Apogee | Apogee | 193 | Microsystems and nanoelectronics |
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View
| Manual Spinner Duo | 1A 29A | Lithography | Olga Mihailichenco | Pasi Haapasalo | Sawatec | SM-200 | | VTT Nanofabrication Centre |
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View
| Manual spinner LARGE | 1G 10 | Lithography | Pasi Haapasalo | | Headway | CB15 | | Microelectronic Systems |
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View
| Manual spinner LSM200 | 1A 12 | Lithography | Olga Mihailichenco | Pasi Haapasalo | Sawatec | LSM 200 | | Microelectronic Systems |
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View
| Manual spinner SCS | 1A 17 | Lithography | Olga Mihailichenco | | SCS | SCS | | Microelectronic Systems |
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View
| Manual spinner SMALL | 1F03 10 | Lithography | Pasi Haapasalo | | Headway | PWM32 | | Microelectronic Systems |
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View
| Manual wafer taper | 1G 27 | Back-end Processes | Harri Pohjonen | | SEC | 3250 | | VTT Nanofabrication Centre |
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View
| Manual Wafer Taper | 1MP 21 | Back-end Processes | Harri Pohjonen | | SEC | 3150 | | VTT Nanofabrication Centre |
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View
| Mapping sheet resistance tool | 1J 10 | Characterization | Antti Tolkki | | Advanced Instrument Technology | CMT-SR2000N | | Microelectronic Systems |
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View
| Mask aligner - Mauri Antero | 2F08 01 | Lithography | Päivikki Repo | | Süss | MA-6 | | Aalto Nanofab |
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View
| Mask aligner MA150 | 1A 02 | Lithography | Olga Mihailichenco | Pasi Haapasalo | Süss MicroTec | MA 150 | | Microelectronic Systems |
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View
| Mask Aligner MA200 | 1G 18 | Lithography | Jaakko Salonen | | Suss MicroTec | MA 200 | | Microelectronic Systems |
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View
| Mask Aligner MA6 | 1G 17 | Lithography | Jaakko Salonen | | Suss MicroTec | MA 6 | | Microelectronic Systems |
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View
| Mask Inspection Station | 1OC 01 | Characterization | Harri Pohjonen | | The MM Microscope Co Inc. | MIS | | Microelectronic Systems |
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View
| MBE Lab A | 2L1020A | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
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View
| MBE Lab B | 2L1020B | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
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View
| MBE Lab C | 2L1020C | Other processes | Päivikki Repo | | NN | NN | | Physical Characteristics of Surfaces and Interface |
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View
| Metal Backgrinder | 1PH 01 | Back-end Processes | Jaana Marles | | GNM | - | | Microelectronic Systems |
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View
| Metal etcher LAM TCP9600 | 1B 05 | Dry etching | Leila Najafi | | LAM/Point 35 | TCP 9600 | | Microelectronic Systems |
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View
| Micro-Raman | 2F13 08 | Characterization | Joonas Holmi | Sanna Arpiainen | WITec | WITec alpha300 RA+ | | Nanotechnology Group |
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View
| Microscope 1 | 1A 23 | Characterization | Jussi Sarkkinen | | Nikon | - | | Microelectronic Systems |
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View
| Microscope 10 | 1F06 06 | Characterization | Jussi Sarkkinen | | Leitz | Ergolux | | Microelectronic Systems |
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View
| Microscope 11 | 1MP 06 | Characterization | Jukka Pihlainen | | Leica AG | WILD MZ8 | | Microelectronic Systems |
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View
| Microscope 12 | 1MP 11 | Characterization | Harri Pohjonen | | Leitz | . | | Microelectronic Systems |
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View
| Microscope 2 | 1B 14 | Characterization | Jussi Sarkkinen | | Nikon | Eclipse? | | Microelectronic Systems |
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View
| Microscope 3 | 1C 07 | Wet Processes | Jussi Sarkkinen | | Nikon | Wclipse? | | Microelectronic Systems |
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View
| Microscope 4 | 1B 08 | Characterization | Jussi Sarkkinen | | Nikon | Eclipse | | Microelectronic Systems |
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View
| Microscope 5 | 1F02 08 | Characterization | Jussi Sarkkinen | | Unknown | Ynknown | | Microelectronic Systems |
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View
| Microscope 5 | 1G 20 | Other processes | Jussi Sarkkinen | | Nikon | Eclipse L200N | | Microelectronic Systems |
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View
| Microscope 8 | 1F04 07 | Characterization | Jussi Sarkkinen | | Unknown | Unknown | | Microelectronic Systems |
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View
| Microscope 9 | 1F05 15 | Characterization | Jussi Sarkkinen | | Nikon | Eclipse L200 | | Microelectronic Systems |
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View
| Microscope A | 2F08 02 | Characterization | Päivikki Repo | | Leitz | Leitz | | Aalto Nanofab |
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View
| Microscope DIC | 1ST 01 | Characterization | Jussi Sarkkinen | | DIC | - | | Microelectronic Systems |
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View
| Microscope F13B | 2F13 13 | Characterization | Antti Peltonen | | Olympus | BX60 | | Aalto Nanofab |
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View
| Microscope Opton | 2L1019 18 | Characterization | Antti Peltonen | | OPTON | NN | | Aalto Nanofab |
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View
| Microscope with camera | 2F10 12 | Characterization | Antti Peltonen | | Opton | NN | | Aalto Nanofab |
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View
| Microscope Zeiss | 2L1020 08 | Characterization | Antti Peltonen | | ZEISS | NN | | Aalto Nanofab |
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View
| Microscope Zeiss Axiotron | 1F01 02 | Characterization | Harri Pohjonen | | Zeiss | Axiotron II | | Microelectronic Systems |
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View
| Microwave asher Aura1000 | 1B 11 | Other processes | Leila Najafi | | GaSonics | Aura 1000 | | Microelectronic Systems |
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View
| MOVPE I / Asterix | 2L1018 01 | Epitaxial Growth | Vladislav Khayrudinov | Sami Suihkonen | Thomas Swan | ? | | Optoelectronics Group |
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View
| MOVPE II | 2L1018 02 | Epitaxial Growth | Sami Suihkonen | | Thomas Swan | 3x2" CSS | | Optoelectronics Group |
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View
| MOVPE III | 2L1018 03 | Epitaxial Growth | Ramesh Raju | | NN | NN | | Optoelectronics Group |
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View
| MOVPE Lab A | 2L1018A | Other processes | Ramesh Raju | | NN | NN | | Aalto Nanofab |
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View
| MOVPE Lab B | 2L1018B | Other processes | Ramesh Raju | | NN | NN | | Physical Characteristics of Surfaces and Interface |
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View
| MOVPE Lab C | 2L1018C | Other processes | Ramesh Raju | | NN | NN | | Aalto Nanofab |
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View
| mPCD scanner | 2L4196 01 | Characterization | Marko Yli-Koski | Hele Savin | Semilab | WT-85 | | Electron Physics Group |
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View
| Nanoimprinting tool NPS300 | 1F03 02 | Nanostructuring | Tomi Haatainen | | Suss MicroTec | NPS3000 | | Microelectronic Systems |
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View
| Needle corona charger | 2L4196 04 | Characterization | Marko Yli-Koski | Michael Dov Serué | KG | KG 201 | | Electron Physics Group |
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View
| Ni plating module bump | 1F05 14 | Electrochemical Deposition | Jaana Marles | | PM Plast | . | | Microelectronic Systems |
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View
| Non destructive X-Ray inspection | 2L4142 11 | Characterization | Vesa Vuorinen | | FEIN FOCUS | FXS-160.24 | | Electronic reliability and integration |
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View
| Non-contact sheet resistivity tool | 1F04 10 | Characterization | Antti Tolkki | | Suragus | EddyCus | | Microelectronic Systems |
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View
| OEM Sputtering System | 1E 03 | Sputtering | Leif Grönberg | Stefan Mertin | OEM | Mark Eclipse IV | | Microelectronic Systems |
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View
| Optical characterization tool FilmTek4000 | 1F13 05 | Characterization | Antti Tolkki | | Scientific Computing Int. | FilmTek 4000 | | Microelectronic Systems |
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View
| Optical Profilometer Contour | 1F01 05 | Characterization | Jaana Marles | | Bruker | GTX | | Microelectronic Systems |
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View
| Optical Profilometer Filmetrics | 2L1020 09 | Characterization | Glenn Ross | Matti Hokkanen | Filmetrics | Profilm3D | | Aalto Nanofab |
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View
| Oven 120 | 2F08 13 | Lithography | Päivikki Repo | | Memmert | Memmert | | Aalto Nanofab |
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View
| Oven 90 | 2F08 14 | Lithography | Päivikki Repo | | Memmert | Memmert | | Aalto Nanofab |
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View
| Oven Adjustable | 2F08 12 | Lithography | Päivikki Repo | | Memmert | Memmert | | Aalto Nanofab |
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View
| Oven Despatch | 1G 02 | Annealing | Jaana Marles | | Despatch Industries | LCC/D1-51N-3 | | Microelectronic Systems |
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View
| Oven Memmert | 2L1019 12 | Annealing | Ville Jokinen | | Memmert | nn | | Aalto Nanofab |
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View
| Oven1 | 1MP 07 | Annealing | Harri Pohjonen | | Carbolite | . | | Microelectronic Systems |
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View
| Oven2 | 1MP 08 | Annealing | Harri Pohjonen | | Memmert | . | | Microelectronic Systems |
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View
| Oven3 | 1MP 09 | Annealing | Harri Pohjonen | | Poweta | . | | Microelectronic Systems |
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View
| Oxidation 3 | 2F07 01C | Furnace Processes | Päivikki Repo | Ville Vähänissi | Centrotherm | Centrotherm | | Aalto Nanofab |
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View
| Oxidation 1 | 2F07 01A | Furnace Processes | Ville Vähänissi | Päivikki Repo | Centrotherm | Centrotherm | | Aalto Nanofab |
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View
| Oxidation 2 | 2F07 01B | Furnace Processes | Päivikki Repo | Ville Vähänissi | Centrotherm | Centrotherm | | Aalto Nanofab |
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View
| Oxidation 4 | 2F07 01D | Furnace Processes | Päivikki Repo | Ville Vähänissi | Centrotherm | Centrotherm | | Aalto Nanofab |
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View
| Oxidation furnace PEO-603 | 1E 20 | Furnace Processes | Antti Tolkki | | ATV | PEO-603 | | Microelectronic Systems |
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View
| Oxide etcher LAM4520 | 1B 03 | Dry etching | Leila Najafi | | LAM/Point 35 | LAM 4520 | | Microelectronic Systems |
|
View
| Oxide Etcher LAM4520XL | 1B 20 | Dry etching | Leila Najafi | | LAM | 4520 XL | | VTT Nanofabrication Centre |
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View
| Oxide ICP etcher STS AOE | 1F10 03 | Dry etching | Feng Gao | | STS | AOE | | Microelectronic Systems |
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View
| Parameter Analyzer Reedholm | 1F06 12 | Characterization | Tomi Hassinen | | Reedholm | . | | Microelectronic Systems |
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View
| Parylene spray deposition tool | 1H06 04 | Other processes | Miika Soikkeli | | SCS Coating | PSD 2010 Labcoater2 | | Microelectronic Systems |
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View
| PECVD Oxford Plasmalab100 | 1F04 11 | CVD & ALD | Mikko Järvi | | Oxford | Plasmalab100 | | Microelectronic Systems |
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View
| PECVD Oxford PlasmaPro System 100 | 1B 18 | CVD & ALD | Mikko Järvi | | Oxford | Plasmapro System 100 | | Microelectronic Systems |
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View
| PECVD Plasmalab F10 | 2F10 07 | CVD & ALD | Victor Ovchinnikov | | Oxford Instruments | Plasmalab 80Plus Oxford Instruments | | Aalto Nanofab |
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View
| Plasma Stripper | 1B 19 | Dry etching | Leila Najafi | | Alpha Plasma | Q240 | | Microsystems and nanoelectronics |
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View
| Plasma stripper 1 PRS801 | 1B 10 | Other processes | Leila Najafi | | Plasma Technology | PRS 801 | | Microelectronic Systems |
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View
| Plasma stripper PRS900 | 1F10 06 | Other processes | Leif Grönberg | | Oxford Instruments | PRS900 | | Microelectronic Systems |
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View
| Plating work bench | 1F05 28 | Electrochemical Deposition | Harri Ilmari | | Plast Service | Plast Service | | Microelectronic Systems |
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View
| Polysilicon etcher LAM4420 | 1B 04 | Dry etching | Leila Najafi | | LAM/Point 35 | LAM 4420 | | Microelectronic Systems |
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View
| Prime Oven HMDS | 2F08 24 | Lithography | Päivikki Repo | | YES | YES-3 | | Aalto Nanofab |
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View
| Primer oven YES-3 | 1A 11 | Lithography | Olga Mihailichenco | | Yield Engineering | YES-3 | | Microelectronic Systems |
|
View
| Primer oven YES-5 | 1G 14 | Lithography | Jukka Huhtala | | Yield Engineering | YES-5 | | Microelectronic Systems |
|
View
| Probe station Cascade | 1F06 01 | Characterization | Tomi Hassinen | | Cascade | . | | Microelectronic Systems |
|
View
| Probe Station PA-150 | 1S05 01 | Characterization | Jaakko Salonen | | Suss Microtec | PA 150 | | Microelectronic Systems |
|
View
| Probestation | 2L4142 03 | Back-end Processes | Ramesh Raju | | Süss | ? | | Electron Physics Group |
|
View
| Profilometer Bruker DektakXT | 1E 19 | Characterization | Stefan Mertin | | Bruker | DektakXT | | VTT Nanofabrication Centre |
|
View
| Profilometer Dektak/XT | 2F10 14 | Characterization | Matti Hokkanen | | Bruker | NN | | Aalto Nanofab |
|
View
| Profilometer Veeco Dektak M6 | 1E 14 | Characterization | Antti Tolkki | | Veeco | Dektak M6 | | Microelectronic Systems |
|
View
| Profilometer Veeco Dektak V200Si | 1F06 04 | Characterization | Leif Grönberg | | Veeco Dektak | V200Si | | Microelectronic Systems |
|
View
| QuickSun | 2L4142 12 | Characterization | Marko Yli-Koski | | Endeas | 120CA | | Electron Physics Group |
|
View
| RCA 2 | 2F11 16 | Wet Processes | Päivikki Repo | Ville Vähänissi | PM Plast | NN | | Aalto Nanofab |
|
View
| Reflectometer 2000M-NIR | 1B 21 | Characterization | Antti Tolkki | | SCI | 2000M-NIR | 88 | VTT Nanofabrication Centre |
|
View
| Reflectometer FilmTek 2000M | 1D 12 | Characterization | Antti Tolkki | | Scientific Computing Int. | FilmTek 2000M | | Microelectronic Systems |
|
View
| Reflectometer Nanospec | 1ST 12 | Characterization | Antti Tolkki | | Nanometrics Incorporated | Nanospec AFT 4150 | | Microelectronic Systems |
|
View
| Reflectometer Opton | 2F11 11 | Characterization | Victor Ovchinnikov | | OPTON | OPTON Axiospeed | | Aalto Nanofab |
|
View
| Reflow oven ATV | 1F05 01 | Annealing | Jaakko Salonen | | ATV | SRO_704_R | | Microelectronic Systems |
|
View
| Rena Cu plating A | 1F05 24 | Electrochemical Deposition | Jaana Marles | | RENA | . | | Microelectronic Systems |
|
View
| Rena Ni plating | 1F05 26 | Electrochemical Deposition | Jaana Marles | | RENA | . | | Microelectronic Systems |
|
View
| RENA Sn plating | 1F05 25 | Electrochemical Deposition | Jaana Marles | | RENA | . | | Microelectronic Systems |
|
View
| Rena SnPb plating | 1F05 27 | Electrochemical Deposition | Jaana Marles | | RENA | . | | Microelectronic Systems |
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View
| Resist oven 1 | 1A 13 | Lithography | Jukka Huhtala | | Memmert | UFE400 | | Microelectronic Systems |
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View
| Resist oven 2 | 1A 14 | Lithography | Jukka Huhtala | | Memmert | UFE400 | | Microelectronic Systems |
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View
| Resist oven 3 | 1A 15 | Lithography | Jukka Huhtala | | Memmert | UFE400 | | Microelectronic Systems |
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View
| Resist oven LOWER (5) | 1G 16 | Lithography | Jukka Huhtala | | Memmert | UFE 400 | | Microelectronic Systems |
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View
| Resist oven UPPER (4) | 1G 15 | Lithography | Jukka Huhtala | | Memmert | UFE 400 | | Microelectronic Systems |
|
View
| Resist Spinner LabSpin | 2F08 29 | Lithography | Ville Rontu | | Süss | LabSpin6 | | Aalto Nanofab |
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View
| Resist Station Gamma4 | 1G 07 | Lithography | Pasi Haapasalo | | Suss MicroTec | Gamma 4 | | Microelectronic Systems |
|
View
| Resist track | 1F08 06 | Lithography | Pasi Haapasalo | | Convac | M6000 | | Microelectronic Systems |
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View
| Resist/developer track AIO | 1A 10 | Lithography | Olga Mihailichenco | Jukka Huhtala | AIO | Duna700 | | Microelectronic Systems |
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View
| RIE Oxford 80Plus | 1F04 08 | Dry etching | Leif Grönberg | | Oxford | 80 PLUS RIE | | Microelectronic Systems |
|
View
| RIE Plasmalab F10 | 2F10 05 | Dry etching | Victor Ovchinnikov | | Oxford Instruments | Plasmalab 80Plus Oxford Instruments | | Aalto Nanofab |
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View
| Rinse Dryer 100 | 2F12 25 | Wet Processes | Päivikki Repo | | Semitool | 2 stock | | Aalto Nanofab |
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View
| Rinse Dryer 150 | 2F12 24 | Wet Processes | Päivikki Repo | | Semitool | nn | | Aalto Nanofab |
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View
| Rinse Dryer 4-6 | 2F08 22 | Other processes | Päivikki Repo | | Semitool | 870S | | Aalto Nanofab |
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View
| Rinse Dryer 4-6 | 2F07 10 | Other processes | Päivikki Repo | | Semitool | 870S | | Aalto Nanofab |
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View
| Rinse Dryer Square | 2F07 11 | Other processes | Päivikki Repo | | Semitool | 870S | | Aalto Nanofab |
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View
| Rinse Dryer Square | 2F08 23 | Other processes | Päivikki Repo | | Semitool | 870S | | Aalto Nanofab |
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View
| Rinse Dryer Verteq 100 | 2F11 15 | Wet Processes | Päivikki Repo | | Verteq | nn | | Aalto Nanofab |
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View
| Rinse Dryer Verteq 150 | 2F11 14 | Wet Processes | Päivikki Repo | | Verteq | 2 stock | | Aalto Nanofab |
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View
| RTA | 2L1020 01 | Annealing | Victor Ovchinnikov | | Russia | Foton-6 | | Aalto Nanofab |
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View
| RTP Jipelec | 2F12 09 | Annealing | Victor Ovchinnikov | Edgar A. Maiorov | Jipelec | Jipelec | | Aalto Nanofab |
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View
| SAM Acoustic microscope | 1E 07 | Characterization | Panu Pekko | | Sonix | HS3000 | | Microelectronic Systems |
|
View
| SEM EBL Zeiss Supra 40 | 2F13 07 | Characterization | Andrew Guthrie | | Zeiss | Zeiss Supra 40 | | Aalto Nanofab |
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View
| SEM Tabletop | 2L4142 02 | Characterization | Tomi Koskinen | | Hitachi | Hitachi TM-1000 | | Aalto Nanofab |
|
View
| SEM Zeiss Supra 35 | 1F13 03 | Characterization | Stefan Mertin | Marcelo Rizzo Piton | Zeiss | Supra35 | | Microelectronic Systems |
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View
| SEM/EDX/e-beam | 1A 05 | Characterization | Marcelo Rizzo Piton | Stefan Mertin | Zeiss | LEO1560 | | Microelectronic Systems |
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View
| Semiconductor Parameter Analyzer | 1F06 08 | Characterization | Tomi Hassinen | | Agilent | 4155C | | Microelectronic Systems |
|
View
| Silicon ICP etcher (Aviza) | 1B 01 | Dry etching | Leila Najafi | | Aviza | Omega i2l | | Microelectronic Systems |
|
View
| Silicon ICP etcher (STS) | 1F10 02 | Dry etching | Feng Gao | | STS | ASE | | Microelectronic Systems |
|
View
| Single Wafer Dryer | 2F08 15 | Wet Processes | Päivikki Repo | | Single Wafer Dryer | Single Wafer Dryer | | Aalto Nanofab |
|
View
| Sink Neutralization | 2F08 25 | Wet Processes | Päivikki Repo | | PM Plast | X | | Aalto Nanofab |
|
View
| Sink Solvent | 2F08 26 | Wet Processes | Päivikki Repo | | PM Plast | X | | Aalto Nanofab |
|
View
| Sinton Lifetime | 2F13 17 | Characterization | Marko Yli-Koski | Michael Dov Serué | Sinton Instruments | WCT-120 & Suns-Voc | | Electron Physics Group |
|
View
| Small LED lamp | 2L4196 09 | Characterization | Michael Dov Serué | Marko Yli-Koski | - | - | | Electron Physics Group |
|
View
| SnAg plating module | 1F05 09 | Electrochemical Deposition | Jaana Marles | | PM Plast | . | | Microelectronic Systems |
|
View
| SNOM/NSOM WITec alpha300 | 2L4166 01 SNOM | Characterization | Ornella Laouadi | Lassi Hällström | WITec | alpha 300 | | Micro and Quantum Systems |
|
View
| Spectroscopic Ellipsometer SE-2000 | 2F09 05 | Characterization | Victor Ovchinnikov | Edgar A. Maiorov | Semilab | SE-2000 | | Aalto Nanofab |
|
View
| Spin Etcher | 1ST 10 | Wet Processes | Jaakko Salonen | | Optiwet | SB30 | | Microelectronic Systems |
|
View
| Spin rinse drier 1 (150 mm) | 1A 19 | Wet Processes | Teija Häkkinen | | Verteq | Superclean 1600-44 | | Microelectronic Systems |
|
View
| Spin Rinse Drier 18 (150 mm) | 1ST 06 | Wet Processes | Jukka Nurminen | | Semitool | SRD 880S | | Microelectronic Systems |
|
View
| Spin rinse drier 2 (150 mm) | 1A 20 | Wet Processes | Teija Häkkinen | | Verteq | Superclean 1600-34 | | Microelectronic Systems |
|
View
| Spin Rinse Drier 20 | 1G 04 | Wet Processes | Harri Ilmari | | Verteq | Superclean 1600-34 | | Microelectronic Systems |
|
View
| Spin rinse drier 5 (100 mm) | 1C 12 | Wet Processes | Kirsi Järvi | | Verteq | Superclean 1600-34 | | Microelectronic Systems |
|
View
| Spin rinse drier 6 (150 mm) | 1C 13 | Wet Processes | Kirsi Järvi | | Verteq | Superclean 1600-34 | | Microelectronic Systems |
|
View
| Spin/Rinse Dryer 11 (100 mm) | 1F02 03 | Wet Processes | Mervi Vehviläinen | | Verteq | Superclean 1600/55M | | Microelectronic Systems |
|
View
| Spin/Rinse Dryer 12 (150 mm) | 1F02 07 | Wet Processes | Mervi Vehviläinen | | Verteq | Superclean 1600-34 | | Microelectronic Systems |
|
View
| Spin/Rinse Dryer 13 (100 mm) | 1F08 11 | Wet Processes | Esa Tuovinen | | Verteq | Superclean 1600/55M | | Microelectronic Systems |
|
View
| Spinner 8 inch | 1F05 21 | Wet Processes | Jaana Marles | | Laurell | EDC1-100-8NPP/IND | | Microelectronic Systems |
|
View
| Spinner BLE | 2F08 17 | Lithography | Päivikki Repo | | BLE | BLE | | Aalto Nanofab |
|
View
| Spinner Cu | 2F11 17 | Wet Processes | Marko Yli-Koski | Hele Savin | Laurell | NN | | Electron Physics Group |
|
View
| Spinner I | 2F03 11 | Lithography | Joonas Peltonen | Antti Peltonen | Laurell | NN | | Nanomagnetism and Spintronics Group |
|
View
| Spinner II | 2F03 12 | Lithography | Joonas Peltonen | Antti Peltonen | Laurell | NN | | Nanomagnetism and Spintronics Group |
|
View
| Spinner Laurell | 2F08 27 | Lithography | Päivikki Repo | Ville Jokinen | Laurell | WS-650MZ-23NPPB | 50 | Aalto Nanofab |
|
View
| Spinner Lithography | 2L1019 38 | Lithography | Päivikki Repo | Ville Jokinen | Laurell | NN | | Microfabrication Group |
|
View
| Sputter Chromium | 2L1019 28 | Sputtering | Vesa Vuorinen | Glenn Ross | Emitech | K575X | 404 | Electronic reliability and integration |
|
View
| Sputter Gold | 2L1019 19 | Sputtering | Victor Ovchinnikov | | OPTON | OPTON | | Aalto Nanofab |
|
View
| Sputter Plasmalab F10 | 2F10 04 | Sputtering | Victor Ovchinnikov | | Oxford Instruments | Plasmalab 400, Oxford Instruments | | Aalto Nanofab |
|
View
| Sputter Sloan | 1KP 05 | Sputtering | Jukka Lappeteläinen | | Sloan | JoSa | | Microelectronic Systems |
|
View
| Sputtering system Mark IV | 1F04 01 | Sputtering | Leif Grönberg | Stefan Mertin | TEL | Mark Eclipse IV | | Microelectronic Systems |
|
View
| Sputtering system 1 PV-LLS801 | 1E 01 | Sputtering | Antti Tolkki | | Provac | PV-LLS801 | | Microelectronic Systems |
|
View
| Sputtering system CLN 200 | 1F04 12 | Sputtering | Stefan Mertin | | Evatec | CLN 200 | | VTT Nanofabrication Centre |
|
View
| Sputtering system MRC | 1F04 09 | Sputtering | Leif Grönberg | Stefan Mertin | MRC | 903 | | Microelectronic Systems |
|
View
| Sputtering system VA | 1F04 04 | Sputtering | Stefan Mertin | Unto Suominen | VonArdenne | CS 730 S Cluster System | | Microelectronic Systems |
|
View
| SPV Scanner | 2L4142 05 | Characterization | Ville Vähänissi | Marko Yli-Koski | Semilab | WT85XL-400 | | Electron Physics Group |
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| SQUID-evaporator | 1TF 06 | Evaporation | Leif Grönberg | | Josa | Josa | | Microelectronic Systems |
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| Stereo Microscope F10B | 2F10 09 | Characterization | Antti Peltonen | | nn | nn | | Nanomagnetism and Spintronics Group |
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| Struers Grinding LaboPol-21 | 2L1177A 02 | Back-end Processes | Vesa Vuorinen | | Struers | LaboPol-21 | | Electronic reliability and integration |
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| Struers Polishing RotoPol-22 | 2L1177A 01 | Back-end Processes | Vesa Vuorinen | | Struers | RotoPol-22 | | Electronic reliability and integration |
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| Suns-Voc | 2L4196 10 | Characterization | Ville Vähänissi | | Sinton | VOC-0246 | | Electron Physics Group |
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| Suntest XLS | 2L4142 08 | Characterization | Marko Yli-Koski | Michael Dov Serué | Atlas Material Testing Solutions | Suntest XLS+ | | Electron Physics Group |
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| Temperature dependent Sinton Lifetime | 2L4196 03 | Characterization | Marko Yli-Koski | Michael Dov Serué | Sinton Instruments | WCT-120TS | | Electron Physics Group |
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| TePla 400 | 2L1019 20 | Other processes | Glenn Ross | Fahimeh Emadi | PVA TEPLA | 400 Plasma System | | Electronics Integration and Reliability |
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| Test_tool_Mko | XXXXXXXX | Nanostructuring | Päivikki Repo | | Random | Random | | Physical Characteristics of Surfaces and Interface |
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| Thin Film Lab A | 2L1019A | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
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| Thin Film Lab B | 2L1019B | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
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| Thin Film Lab C | 2L1019C | Other processes | Päivikki Repo | | Nanofab | Nanofab | | Aalto Nanofab |
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| TMAH etch | 2F12 11 | Wet Processes | Päivikki Repo | Pekka Törmä | NN | NN | | Aalto Nanofab |
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| Ultrasonic Bath | 2F12 04 | Wet Processes | Päivikki Repo | | nn | nn | | Aalto Nanofab |
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| UV Lamp System | 2L1019 16 | Characterization | Ville Jokinen | | DYMAX | ECE 2000 | | Microfabrication Group |
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| UV photostabilizer | 1B 06 | Other processes | Olga Mihailichenco | | Fusion | M150PC | | Microelectronic Systems |
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| UV-Lamp Visual Inspection | 2F09 10 | Other processes | Päivikki Repo | Ville Vähänissi | nn | nn | | Aalto Nanofab |
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| UV-NIL (accessory for Mauri Antero) | 2F08 01B | Lithography | Nagarajan Subramaniyam | | Suss | Suss MA-6 | | Aalto Nanofab |
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| Vacuum Furnace | 1TF 05 | Annealing | Jaakko Saarilahti | | Thermco | . | | Microelectronic Systems |
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| Vacuum Furnace Webb | 2L1019 21 | Annealing | Glenn Ross | Kristina Bespalova | Webb | Red Devil M | | Electronics Integration and Reliability |
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| Vacuum Oven | 1G 13 | Lithography | Jukka Huhtala | | Heraus | Oven | | Microelectronic Systems |
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| Vacuum Oven | 1B 22 | Annealing | Jukka Huhtala | | Goldbrunn | 1450 | | VTT Nanofabrication Centre |
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| Wafer backgrinder 7AF | 1ST 02 | Back-end Processes | Jaakko Salonen | | Strasbaugh | 7AF | | Microelectronic Systems |
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| Wafer Bonder AML | 2F11 08 | Wafer Bonding | Victor Ovchinnikov | | AML | AML-AWB | | Aalto Nanofab |
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| Wafer Bonder EVG 510 | 1J 08 | Wafer Bonding | Feng Gao | | EVG | EVG 510 | | Microelectronic Systems |
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| Wafer bonder EVG5201S | 1E 16 | Wafer Bonding | Panu Pekko | | Electronic Vision | EVG5201S | | Microelectronic Systems |
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| Wafer Cleaner Batchspray Acid | 1C 24 | Wet Processes | Harri Ilmari | | Siconnex | Batchspray acid 2.0 | 93 | VTT Nanofabrication Centre |
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| Wafer Defect Inspection System | 1G 29 | Characterization | Antti Tolkki | | NanoPhotonics | Reflex TT | | Microelectronic Systems |
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| Wafer spinner POLOS | 1G 22 | Lithography | Pasi Haapasalo | | SPS | MCD200 NPP | | Microelectronic Systems |
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| Wafer Stepper FPA 3000-i4 | 1A 04 | Lithography | Olga Mihailichenco | Jussi Sarkkinen | Canon | FPA 3000-i4 | 711 | Microelectronic Systems |
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| Wafer Taper | 1G 19 | Other processes | Harri Pohjonen | | Longhill Industries LTD | LH836 | | Microelectronic Systems |
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| Vector Network Analyzer | 1F06 07 | Characterization | Tomi Hassinen | | Anritsu | . | | Microelectronic Systems |
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| Wet Bench F11A | 2F11 06 | Wet Processes | Päivikki Repo | Ville Vähänissi | Stangl | Stangl | 26 | Aalto Nanofab |
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| Wet Bench MIXED ETCHANTS | 1F02 04 | Wet Processes | Harri Ilmari | | Stangl | ME | | Microelectronic Systems |
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| Wet Bench PRE-CLEAN | 2F12 06 | Wet Processes | Päivikki Repo | Harri Paasinummi | PMPlast | old VTT wet bench | | Aalto Nanofab |
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| Wet Bench RCA 1-2 | 2F07 08 | Wet Processes | Päivikki Repo | Ville Vähänissi | Stangl | Acid | | Aalto Nanofab |
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| Wet bench D CLEAN 1 | 1D 07 | Wet Processes | Harri Ilmari | | Stangl | Stangl07 | | Microelectronic Systems |
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| Wet bench D CLEAN 2 | 1D 09 | Wet Processes | Harri Ilmari | | Stangl | Stangl | | Microelectronic Systems |
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| Wet Bench DCLEAN 3 | 1D 10 | Wet Processes | Harri Ilmari | | Stangl Singulus | - | | Microelectronic Systems |
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| Wet bench DEVELOP 2 | 1G 23 | Wet Processes | Harri Ilmari | | Stangl | WB | | Microelectronic Systems |
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| Wet Bench Development | 2F08 10A | Wet Processes | Päivikki Repo | | Stangl | Acid | | Aalto Nanofab |
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| Wet bench HF 1 | 1C 04 | Wet Processes | Harri Ilmari | | Stangl | Stangl | | Microelectronic Systems |
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| Wet bench HF 2 | 1C 05 | Wet Processes | Harri Ilmari | | Stangl | Stangl | | Microelectronic Systems |
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| Wet bench Hot plates | 2F08 18 | Lithography | Päivikki Repo | | PMPlast | PMPlast | | Aalto Nanofab |
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| Wet Bench KOH | 2L1020 11 | Wet Processes | Päivikki Repo | | Plade | NN | | Aalto Nanofab |
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| Wet Bench MASK CLEAN | 1G 26 | Wet Processes | Harri Ilmari | | Stangl | Mask Clean | | Microelectronic Systems |
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| Wet bench METAL ETCH | 1C 08 | Wet Processes | Harri Ilmari | | Stangl | Stangl | | Microelectronic Systems |
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| Wet Bench Oxide Etch | 2F08 10B | Wet Processes | Päivikki Repo | | Stangl | nn | | Aalto Nanofab |
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| Wet bench Piranha | 2F08 10C | Wet Processes | Päivikki Repo | | Stangl | NA | | Aalto Nanofab |
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| Wet bench PIRANHA | 1C 16 | Wet Processes | Harri Ilmari | | Stangl | Stangl | | Microelectronic Systems |
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| Wet Bench POLYMERS | 1F05 31 | Wet Processes | Harri Ilmari | | Stangl | Polymers | | Microelectronic Systems |
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| Wet bench POSISTRIP 1 | 1C 10 | Wet Processes | Harri Ilmari | | Stangl | Stangl | | Microelectronic Systems |
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| Wet bench POSISTRIP 2 | 1C 11 | Wet Processes | Harri Ilmari | | Stangl | Stangl | | Microelectronic Systems |
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| Wet bench POST CMP | 1ST 05 | Wet Processes | Jaakko Salonen | | SSE/Arias | . | | Microelectronic Systems |
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| Wet bench Resist Removal | 2F08 09 | Wet Processes | Päivikki Repo | | Stangl | Solvent | | Aalto Nanofab |
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| Wet bench RINSE | 1D 08 | Wet Processes | Harri Ilmari | | Plast Service | Rinse module | | Microelectronic Systems |
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| Wet bench RINSE 1 | 1F02 06 | Wet Processes | Harri Ilmari | | Stangl | RINSE | | Microelectronic Systems |
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| Wet bench RINSE 2 | 1F03 04 | Wet Processes | Joonas Peltonen | | Stangl | Rinse | | Microelectronic Systems |
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| Wet bench SOLVENTS | 1A 22 | Wet Processes | Harri Ilmari | | Stangl | - | | Microelectronic Systems |
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| Wet Bench spinner | 2F08 16 | Lithography | Päivikki Repo | | Stangl | Wet Bench with Spinner | | Aalto Nanofab |
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| Wet bench STANDARD ETCHANTS | 1F02 02 | Wet Processes | Harri Ilmari | | Stangl | SE | | Microelectronic Systems |
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| Wire bonder | 1MP 03 | Back-end Processes | Harri Pohjonen | | F&K Delvotec | Delvotec 5430 | | Microelectronic Systems |
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| Wire bonder | 1MP 20 | Back-end Processes | Paula Holmlund | | MicroPointPro | iBond5000 | | VTT Nanofabrication Centre |
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| Wire Bonder Bondtec 5330 | 2L4142 13 | Back-end Processes | Azat Gubaydullin | Yu-Cheng Chang | FS bondtec | 5330 | | Aalto Nanofab |
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| Wire bonder Delvotec 53 | 2L4142 01 | Back-end Processes | Azat Gubaydullin | Yu-Cheng Chang | Delvotec 53 | Delvotec 53BDA | | Aalto Nanofab |
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| Wire Bonder Delvotec 53XX | 2L4142 09 | Back-end Processes | Azat Gubaydullin | Yu-Cheng Chang | Delvotec | 53XX | | PICO |
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| Workshop 1177A | 2L1177A | Other processes | Juha Lievonen | | Nanofab | Nanofab | | Aalto Nanofab |
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| Workshop 1177B | 2L1177B | Other processes | Juha Lievonen | | Nanofab | Nanofab | | Aalto Nanofab |
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| XeF2 Etcher | 1E 18 | Dry etching | Jaakko Saarilahti | | SPTS | Xactix | | Microelectronic Systems |
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| Xenon lamp | 2L4196 06 | Characterization | Ville Vähänissi | | Micronova | - | | Electron Physics Group |
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| XRD Panalytical | 2L4168 02 | Characterization | Sami Suihkonen | Ramesh Raju | Panalytical | NN | | Nanotechnology Group |