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 NameTool IdCategory1st responsible2nd responsibleManufacturerModelProcess responsibleResponsible group
View Mechanical testing system MTS2L1155 01CharacterizationGlenn RossElmeri ÖsterlundMTSNN Electronics Integration and Reliability
View 240 LED lamp2L4197 01CharacterizationMarko Yli-KoskiVille VähänissiCreeCree Edge High Output Electron Physics Group
View AFM DI31001F13 01CharacterizationMarkku Kainlauri DIDimension 3100 Microelectronic Systems
View AFM Dimension Icon2L4168 03CharacterizationRamesh RajuYifan ZhouBrukerDimension Icon Aalto Nanofab
View AFM NT-MDT Ntegra2L4168 01CharacterizationCamilla TossiJori LemettinenNtegraNT-MDT Ntegra AFM Aalto Nanofab
View Air Plasma Treater2L1020 ??Other processesSami Suihkonen nnnn Aalto Nanofab
View ALD Reactor ALD-12F09 11CVD & ALDVille VähänissiHeli SeppänenBeneqBeneq TFS-500  Aalto Nanofab
View ALD Reactor ALD-22F09 09CVD & ALDVille VähänissiJohn RönnBeneqBeneq TFS-500 Aalto Nanofab
View ALD Reactor ALD-32F09 07CVD & ALDVille VähänissiVille RontuPicosunSUNALE R-200 Advanced Aalto Nanofab
View ALD reactor SUNALE R-150B1B 12CVD & ALDOili Ylivaara PicosunSUNALE R-150B Microelectronic Systems
View Alignment verification system DSM81J 04CharacterizationSami Ylinen Süss MicrotechDSM8 Microelectronic Systems
View AlN Sputtering System1E 04SputteringStefan Mertin AMSSMT2004 Microelectronic Systems
View Aluminium Etch2F12 26 Wet ProcessesPäivikki RepoVille VähänissiPM PlastNN Aalto Nanofab
View Annealing 2F07 04AAnnealingPäivikki RepoVille VähänissiCentrothermCentrotherm Aalto Nanofab
View Annealing furnace PEO-6031D 03AnnealingAntti Tolkki ATVPEO-603 Microelectronic Systems
View Anodization Cell1H05 02Other processesLeif Grönberg Protoshop. Microelectronic Systems
View Au plating module1F05 06Electrochemical DepositionJaana Marles PM Plast Au Microelectronic Systems
View BCB Etcher1G 06Dry etchingJaana Marles LAMAutoEtch 590 Microelectronic Systems
View Black Magic2L1018 04 Epitaxial GrowthSami SuihkonenChangfeng LiNNNN Optoelectronics Group
View Bond Aligner1J 09Wafer BondingFeng Gao EVGEVG 610 Microelectronic Systems
View Bond aligner EVG6201E 17Wafer BondingPanu Pekko Electronic VisionEVG620 Microelectronic Systems
View Cassette washing machine1H04 01Other processesHarri Ilmari Miele. Microelectronic Systems
View CD MT30001A 24CharacterizationJussi Sarkkinen MueTecMT3000 VTT Nanofabrication Centre
View CMP 6DSSP1ST 04Back-end ProcessesJaakko Salonen Strasbaugh6DSSP Microelectronic Systems
View CMP Strasbaugh 6EC1MC 01Back-end ProcessesJaakko Salonen Strasbaugh6EC Microelectronic Systems
View CO2-dryer BalTec CPD4081C 02Other processesJaakko Saarilahti BalTecCPD 408 Microelectronic Systems
View Coater Developer EVG1201A 25LithographyOlga Mihailichenco EVGEVG120711Microelectronic Systems
View Contact Angle Meter THETA2F13 10CharacterizationVille JokinenJoonas HeikkinenBiolin Scientificsnn43Aalto Nanofab
View DCA Sputtering System1F04 03SputteringStefan Mertin DCA InstrumentsDCA M450 Microelectronic Systems
View Developer track Convac1A 03LithographyOlga Mihailichenco ConvacM6000 Microelectronic Systems
View Dicing Saw DFD63411MP 19 Back-end ProcessesHarri PohjonenJaana MarlesDiscoDFD6341 Microelectronic Systems
View Dicing saw Disco1MP 01Back-end ProcessesHarri Pohjonen DiscoDFD651 Microelectronic Systems
View Dicing saw Loadpoint1MP 02Back-end ProcessesHarri Pohjonen LoadpointMicroAce 3 Series 2 Microelectronic Systems
View Die Sorter IC 12001MP 18Other processesGiovanni Delrosso InfotechIC 1200 VTT Nanofabrication Centre
View Diffusion furnace, A1 anneal1D 01_A1Furnace ProcessesPaula KettulaAntti TolkkiCentrothermE1200 HT 260-4 Microelectronic Systems
View Diffusion furnace, A2 oxidation1D 01_A2Furnace ProcessesPaula KettulaAntti TolkkiCentrothermE1200 HT 260-4 Microelectronic Systems
View Diffusion furnace, A3 oxidation1D 01_A3Furnace ProcessesPaula KettulaAntti TolkkiCentrothermE1200 HT 260-4 Microelectronic Systems
View Diffusion furnace, A4 oxidation1D 01_A4Furnace ProcessesPaula KettulaAntti TolkkiCentrothermE1200 HT 260-4 Microelectronic Systems
View Disco DADdy2L1019 41 Back-end ProcessesJoonas HeikkinenJorden SeniorDiscoDAD3220  Aalto Nanofab
View DLTS2L4142 06CharacterizationVille VähänissiMarko Yli-KoskiSemilabDLS-83D Electron Physics Group
View Dual Spin Rinse Drier 16 and 17 1F05 23Wet ProcessesHarri Ilmari Rhetech/SemitoolSRD 8300 S Microelectronic Systems
View Dual SRD 14 (150mm) and 15 (200 mm)1G 12Wet ProcessesLeena Nurminen Goldfinger/VerteqSuperclean 1800-6 Microelectronic Systems
View Dual SRD 3 (100 mm) and 4 (150 mm)1C 06Wet ProcessesKirsi Järvi SemitoolSRD 880S Microelectronic Systems
View Dual SRD 6 (150 mm) and 10 (200mm)1D 11Wet ProcessesLeena Nurminen SemitoolSRD 880S Microelectronic Systems
View Dual SRD 7 (100 mm) and 8 (150 mm)1D 06Wet ProcessesLeena Nurminen Rhetech/SemitoolSRD 87S61 Microelectronic Systems
View EBL Pattern Generator 2F13 07BLithographyJoonas Peltonen Raith GMBHNN Aalto Nanofab
View EBL Vistec2F03 01LithographyJoonas Peltonen VistecEPBG5000pES Aalto Nanofab
View Electrochemical Etching Cell1C 14Wet ProcessesKestutis Grigoras AMMTMPSB200 Microelectronic Systems
View Electroplating Cu2L1019 30 Electrochemical DepositionGlenn RossVille RontuNB TechnologiesNN Aalto Nanofab
View Electroplating Ni 2L1019 32Electrochemical DepositionGlenn RossVille RontuNB TechnologiesNN Aalto Nanofab
View Electroplating Sn2L1019 31 Electrochemical DepositionGlenn RossVille RontuNB TechnologiesNN Aalto Nanofab
View Electrostatic Carrier1WC 10Other processesJukka Pihlainen ProtecPT3000 Microelectronic Systems
View Ellipsometer Plasmos1F04 06CharacterizationLeif Grönberg Plasmos Unknown Microelectronic Systems
View Ellipsometer Plasmos2F09 04CharacterizationVictor OvchinnikovVille VähänissiPlasmosPlasmos SD2300 Aalto Nanofab
View Evaporator e-gun Edwards 2L1019 02EvaporationChristoffer Joonas KauppinenHenrik Olli-Pekka MäntynenEdwards Edwards E306A Aalto Nanofab
View Evaporator e-gun Varian 2L1019 01EvaporationTaneli Juntunen Varian Varian (B 'n B) Aalto Nanofab
View Evaporator LISA2S09 02EvaporationLibin WangFrancisco Freire FernándezInstrumentti MattilaIM-9912 PICO
View Evaporator MASA2S09 01EvaporationDIBYENDU HAZRAXueyin BAIMASAIM-9912 Aalto Nanofab
View FIB Helios2F13 04NanostructuringAntti PeltonenNikolai ChekurovFEIHelios Nanolab600 Aalto Nanofab
View Field emission SEM2L4142 10CharacterizationVesa VuorinenElmeri ÖsterlundJEOLJSM-6335F404Electronic reliability and integration
View Film stress measurement tool1F01 07CharacterizationOili Ylivaara Toho TechnologyFLX 2320-S Microelectronic Systems
View Flash Light2F13 16B CharacterizationMarko Yli-Koski HenselEHT 3000 Focus + TRIA 3000 S Electron Physics Group
View Flatness meter ADE1ST 03CharacterizationAri Häärä ADE9500 Ultra Gage Microelectronic Systems
View Flip-chip bonder B1F01 04Back-end ProcessesHarri Pohjonen SETFC150/1998 Microelectronic Systems
View Four Point Probe Old2F11 12CharacterizationAntti Peltonen NNNN Aalto Nanofab
View Four-point Probe Loresta1F06 03CharacterizationLeif Grönberg Loresta AP. Microelectronic Systems
View Fume Hood HF etch2F12 20Wet ProcessesPäivikki RepoVille VähänissiPMPlast1900-710 Aalto Nanofab
View Fume hood Metal etch2F12 12Wet ProcessesPäivikki Repo PMPlastNN Aalto Nanofab
View Fume Hood TMAH2F12 10Wet ProcessesPäivikki Repo PMPlastNN Aalto Nanofab
View Fume Hood A2L1020 03Wet ProcessesSami Suihkonen NNNN Aalto Nanofab
View Fume Hood A2F07 02Wet ProcessesVille VähänissiMarko Yli-KoskiPMplastPMPlast Electron Physics Group
View Fume Hood Acid work2L1019 36 Wet ProcessesPäivikki Repo VisuAalto Aalto Nanofab
View Fume Hood Acid work 12F12 16Wet ProcessesPäivikki Repo PMPlastNN Aalto Nanofab
View Fume Hood Acid work 22F12 19 Wet ProcessesPäivikki Repo PMPlastAcids Aalto Nanofab
View Fume Hood ALD2F09 01Wet ProcessesVille Vähänissi PMPlastPMPlast Aalto Nanofab
View Fume Hood Cu Contamination 2F11 09Wet ProcessesMarko Yli-KoskiHele SavinPMPlastSpinner Aalto Nanofab
View Fume Hood Electroplating2L1019 33 Wet ProcessesGlenn RossVille RontuNB TechnologiesNN Aalto Nanofab
View Fume Hood KOH 2L1019 37 Wet ProcessesPäivikki Repo VisuAalto Aalto Nanofab
View Fume Hood Lift off2F12 18 Wet ProcessesPäivikki Repo PM PlastType no 2580-1 Aalto Nanofab
View Fume Hood Lithography2L1019 34 Wet ProcessesPäivikki Repo VisuAalto Aalto Nanofab
View Fume Hood Salo2S10 01Wet ProcessesJuha Lievonen NNNN Aalto Nanofab
View Fume Hood Solvents 2F12 05Wet ProcessesPäivikki Repo  PMPlastFume Hood Aalto Nanofab
View Fume Hood Solvents2L1019 35 Wet ProcessesPäivikki Repo VisuAalto Aalto Nanofab
View Fume Hood Spinner2S11 01Wet ProcessesJoonas Peltonen PMPlast Photoresist  Aalto Nanofab
View Fumehood1TF 03Wet ProcessesTapio Mäkelä . . Microelectronic Systems
View Fumehood1TF 04Wet ProcessesTapio Mäkelä . . Microelectronic Systems
View Fumehood ACID1C 21Wet ProcessesHarri Ilmari Lotus. Microelectronic Systems
View Fumehood BOAT CLEAN1C 22Wet ProcessesHarri Ilmari Lotus Boat Clean Microelectronic Systems
View Fumehood DEVELOP1A 21Wet ProcessesHarri Ilmari Lotus - Microelectronic Systems
View Fumehood for anodization1H05 03Wet ProcessesLeif Grönberg .. Microelectronic Systems
View Fumehood IMPLANT1ST 09Wet ProcessesPekka Ikonen Lotus. Microelectronic Systems
View Fumehood KULTA1F05 16Wet ProcessesHarri Ilmari Semitool. Microelectronic Systems
View Fumehood LIFT-OFF1WC 03Wet ProcessesHarri Ilmari Stangl. Microelectronic Systems
View Fumehood LITHO 11A 16LithographyOlga Mihailichenco Lotus - Microelectronic Systems
View Fumehood MASK CLEAN1C 09Wet ProcessesHarri Ilmari Lotus. Microelectronic Systems
View Fumehood PLATING1F05 22Electrochemical DepositionHarri Ilmari Lotus. Microelectronic Systems
View Fumehood RELEASE IPA1C 03Wet ProcessesHarri Ilmari Lotus. Microelectronic Systems
View Fumehood SCALE&CUT1S01 01Wet ProcessesMeeri Partanen Amsel. Microelectronic Systems
View Fumehood SERVICE ACIDS1WC 01Wet ProcessesHarri Ilmari Amsel . Microelectronic Systems
View Fumehood SERVICE SOLVENTS1WC 02Wet ProcessesHarri Ilmari PMPlast . Microelectronic Systems
View Fumehood solvents for cleaning parts1H06 01Wet ProcessesJukka Huhtala PM Plast. Microelectronic Systems
View Fumehood TMAH1C 17Wet ProcessesHarri Ilmari Lotus. Microelectronic Systems
View Fumehood VESSEL1F02 05Wet ProcessesHarri Ilmari Stangl. Microelectronic Systems
View Fumehood WET SERVICE1H04 02Wet ProcessesHarri Ilmari LotusWS Microelectronic Systems
View Furnace MiniBrute Lower2L1020 02BFurnace ProcessesVictor Ovchinnikov ThermcoMiniBrute  Physical Characteristics of Surfaces and Interface
View Furnace MiniBrute Upper2L1020 02AFurnace ProcessesVictor Ovchinnikov Mini-BruteMini-Brute Aalto Nanofab
View Furnace PEO2F12 08Furnace ProcessesVictor OvchinnikovPäivikki RepoPEOPEO-601/ATV Aalto Nanofab
View Glove Box ALD old2EC 05Other processesVille Vähänissi NNNN Aalto Nanofab
View Glovebox ALD Precursors2EC 04CVD & ALDVille Vähänissi Innovative TechnologyPureLab HE 21 Micro and Quantum Systems
View Goniometer1WC 04CharacterizationSami Vähänen Unknown Unknown Microelectronic Systems
View Hall Measurement System EcopiaL24166 01 CharacterizationSami SuihkonenChristoffer Joonas KauppinenEcopiaHMS500 Optoelectronics Group
View Halogen lamp2L4196 05CharacterizationMarko Yli-KoskiMichael Dov SeruéOSRAMAluPAR 64 NSP Electron Physics Group
View Heating Bath IKA2F12 22Wet ProcessesJorden Senior IKAHBR 4 PICO
View HF vapor etcher MEMS-CET1B 13Dry etchingPaula Kettula PrimaxxMEMS-CET321Microelectronic Systems
View HMDS Desiccator2F08 21LithographyPäivikki Repo nnnn Aalto Nanofab
View Hot Plate2F03 06LithographyJoonas PeltonenAntti PeltonenNNNN Nanomagnetism and Spintronics Group
View Hot plate - Tmax 250C2L4197 02CharacterizationMarko Yli-KoskiVille VähänissiStuartSB-500 Electron Physics Group
View Hot plate - Tmax 250C2L4196 07CharacterizationMarko Yli-KoskiVille VähänissiStuartSB-500 Electron Physics Group
View Hot plate - Tmax 350C2L4196 08CharacterizationMarko Yli-KoskiVille VähänissiIKAC-MAG HS10 Electron Physics Group
View Hot plate BLE1A 18LithographyOlga Mihailichenco BLEBLE Microelectronic Systems
View Hot Plate Matti2L1019 15LithographyVille Jokinen PräzithermHot plate Aalto Nanofab
View Hot Plate Mervi2F08 20LithographyPäivikki RepoVille VähänissiUniTemp GmbHHP-220 Aalto Nanofab
View Hot Plate Pia2F08 19 AnnealingPäivikki RepoVille VähänissiUniTemp GmbHHP-220 Aalto Nanofab
View Hotplate OPTIHOT HB201G 09LithographyLeif Grönberg ATMOPTIhot HB20 Microelectronic Systems
View Hotplate small1F03 09LithographyAndrey Shchepetov Hamatech Unknown Microelectronic Systems
View HVPE2L1020 05CVD & ALDSami Suihkonen BeneqBeneq Aalto Nanofab
View ICP-RIE Plasmalab 1002F09 12Dry etchingChristoffer Joonas KauppinenToni PasanenOxford InstrumentsOxford Instruments Plasmalab System100 - ICP 180 Aalto Nanofab
View Impedance Analyzer1F06 09CharacterizationAri Häärä Agilent4294A Microelectronic Systems
View In plating module1F05 04Electrochemical DepositionJaana Marles PM Plast In Microelectronic Systems
View Ion Beam Etcher2F11 13Dry etchingVictor OvchinnikovVille RontuMeyer BurgerIonSys 500 Aalto Nanofab
View Ion Beam Trimmer1E 15Dry etchingJaakko Salonen AMSystems? Microelectronic Systems
View Ion Implanter Eaton2F10 10Ion ImplantationVictor Ovchinnikov EATON EATON NV-3206 Aalto Nanofab
View Ion implanter Eaton 82001ST 08Ion ImplantationAntti Tolkki Eaton NV8200 Microelectronic Systems
View IR-Baker1G 05AnnealingJaana Marles Wegra B.V.IR-baker 3 kW Microelectronic Systems
View IR-Inspector1J 13CharacterizationBin GuoPanu PekkoSchott Moritex- Microelectronic Systems
View Kelvin probe*2L1020 ?CharacterizationSami Suihkonen NNNN Aalto Nanofab
View KOH setup2L1019 08Wet ProcessesPäivikki RepoGianmario ScottiNNNN Microfabrication Group
View Laser Micromachining System2L1020 07 Other processesVille Rontu Azpect / Newportna Aalto Nanofab
View Laser Wafer Marker2L1019 29Other processesJoonas IsometsäIsmo HeikkinenCencorp300 LM Electron Physics Group
View Laserwriter2F08 03LithographyGianmario ScottiNikolai ChekurovMicrotechLW 405 Aalto Nanofab
View Lifetime Scanner PV-20002F13 11CharacterizationVille VähänissiMarko Yli-KoskiSemilabPV-2000A Electron Physics Group
View Linear Corona Charger2F13 16 CharacterizationVille VähänissiMarko Yli-KoskiSemilabLCC-300 Electron Physics Group
View LPCVD furnace, B1 LTO1D 02_B1Furnace ProcessesPaula KettulaAntti TolkkiCentrothermE1200 HT 260-4 Microelectronic Systems
View LPCVD furnace, B2 TEOS1D 02_B2Furnace ProcessesPaula KettulaAntti TolkkiCentrothermE1200 HT 260-4 Microelectronic Systems
View LPCVD furnace, B3 POLY1D 02_B3Furnace ProcessesPaula KettulaAntti TolkkiCentrothermE1200 HT 260-4 Microelectronic Systems
View LPCVD furnace, B4 Nitride1D 02_B4Furnace ProcessesPaula KettulaAntti TolkkiCentrothermE1200 HT 260-4 Microelectronic Systems
View LPCVD PolySi2F07 04CCVD & ALDAntti PeltonenTapani VehmasCentrothermCentrotherm Aalto Nanofab
View LPCVD SiN2F07 04BCVD & ALDPekka Törmä CentrothermCentrotherm Aalto Nanofab
View Manual prober1F06 02CharacterizationLeif Grönberg Rucker&Kolls . Microelectronic Systems
View Manual spinner LARGE1G 10LithographyLeif Grönberg HeadwayCB15 Microelectronic Systems
View Manual spinner LSM2001A 12LithographyOlga Mihailichenco SawatecLSM 200 Microelectronic Systems
View Manual spinner SCS1A 17LithographyOlga Mihailichenco SCSSCS Microelectronic Systems
View Manual spinner SMALL1F03 10LithographyAndrey Shchepetov HeadwayPWM32 Microelectronic Systems
View Mapping sheet resistance tool1E 12CharacterizationAntti Tolkki Advanced Instrument TechnologyCMT-SR2000N Microelectronic Systems
View Mask aligner - Mauri Antero2F08 01LithographyPäivikki RepoVille VähänissiSüss MA-6 Aalto Nanofab
View Mask aligner MA1501A 02LithographyOlga Mihailichenco Süss MicroTecMA 150 Microelectronic Systems
View Mask Aligner MA2001G 18LithographyJaakko Salonen Suss MicroTecMA 200 Microelectronic Systems
View Mask Aligner MA61G 17LithographyJaakko Salonen Suss MicroTecMA 6 Microelectronic Systems
View Mask Inspection Station1OC 01CharacterizationHarri Pohjonen The MM Microscope Co Inc. MIS Microelectronic Systems
View MBE2L1020 04Epitaxial GrowthSami Suihkonen VG VG Semicon Aalto Nanofab
View Metal Backgrinder1PH 01Back-end ProcessesAri Häärä GNM - Microelectronic Systems
View Metal etcher LAM TCP96001B 05Dry etchingFeng GaoPaula KettulaLAM/Point 35TCP 9600 Microelectronic Systems
View Micro-Raman 2F13 08CharacterizationJoonas HolmiSanna ArpiainenWITecWITec alpha300 RA Nanotechnology Group
View Microscope 11A 23CharacterizationAri Häärä Nikon - Microelectronic Systems
View Microscope 101F06 06CharacterizationAri Häärä LeitzErgolux Microelectronic Systems
View Microscope 111MP 06CharacterizationAri Häärä Leica AGWILD MZ8  Microelectronic Systems
View Microscope 121MP 11CharacterizationHarri Pohjonen Leitz. Microelectronic Systems
View Microscope 21B 14CharacterizationAri Häärä Nikon Eclipse? Microelectronic Systems
View Microscope 31C 07Wet ProcessesAri Häärä Nikon Wclipse? Microelectronic Systems
View Microscope 41B 08CharacterizationAri Häärä NikonEclipse Microelectronic Systems
View Microscope 51G 20Other processesLeif Grönberg NikonEclipse L200N Microelectronic Systems
View Microscope 61F02 08CharacterizationAri Häärä  Unknown Ynknown Microelectronic Systems
View Microscope 81F04 07CharacterizationLeif Grönberg  Unknown Unknown Microelectronic Systems
View Microscope 91F05 15CharacterizationAri Häärä NikonEclipse L200 Microelectronic Systems
View Microscope A2F08 02CharacterizationPäivikki RepoVille RontuLeitzLeitz Aalto Nanofab
View Microscope DIC1ST 01CharacterizationAri Häärä DIC - Microelectronic Systems
View Microscope F13B2F13 13CharacterizationVille Rontu OlympusNN Aalto Nanofab
View Microscope Opton2L1019 18CharacterizationAntti Peltonen OPTONNN Aalto Nanofab
View Microscope with camera2F10 12CharacterizationVille Rontu NNNN Aalto Nanofab
View Microscope Zeiss 2L1020 08CharacterizationVille Rontu ZEISSNN Aalto Nanofab
View Microscope Zeiss Axiotron1F01 02CharacterizationHarri Pohjonen ZeissAxiotron II Microelectronic Systems
View Microwave asher Aura10001B 11Other processesJames Dekker GaSonicsAura 1000 Microelectronic Systems
View MOVPE I / Asterix2L1018 01Epitaxial GrowthVladislav KhayrudinovSami SuihkonenThomas Swan? Optoelectronics Group
View MOVPE II2L1018 02Epitaxial GrowthSami SuihkonenTuomas HaggrenThomas Swan3x2" CSS Optoelectronics Group
View MOVPE III2L1018 03Epitaxial GrowthJori Lemettinen NNNN Optoelectronics Group
View mPCD scanner2L4196 01CharacterizationMarko Yli-KoskiHele SavinSemilabWT-85 Electron Physics Group
View Nanoimprinting tool NPS3001F03 02NanostructuringTomi Haatainen Suss MicroTecNPS3000 Microelectronic Systems
View Needle corona charger2L4196 04CharacterizationMarko Yli-KoskiMichael Dov SeruéKGKG 201 Electron Physics Group
View Ni plating module1F05 03Electrochemical DepositionJaana Marles PM Plast Ni Microelectronic Systems
View Ni plating module bump1F05 14Electrochemical DepositionJaana Marles PM Plast . Microelectronic Systems
View Non destructive X-Ray inspection2L4142 11CharacterizationVesa Vuorinen FEIN FOCUSFXS-160.24 Electronic reliability and integration
View Non-contact sheet resistivity tool1F04 10CharacterizationAntti Tolkki SuragusEddyCus Microelectronic Systems
View OEM Sputtering System1E 03SputteringLeif Grönberg OEMMark Eclipse IV Microelectronic Systems
View Optical characterization tool FilmTek40001F13 05CharacterizationAntti Tolkki Scientific Computing Int.FilmTek 4000 Microelectronic Systems
View Optical Profilometer Contour1F01 05CharacterizationFeng Gao BrukerGTX Microelectronic Systems
View Optical Profilometer Filmetrics2L1019 40 CharacterizationPäivikki RepoGlenn RossFilmetricsProfilm3D Aalto Nanofab
View Oven 1202F08 13LithographyPäivikki RepoVille VähänissiMemmertMemmert Aalto Nanofab
View Oven 902F08 14LithographyPäivikki RepoVille VähänissiMemmertMemmert Aalto Nanofab
View Oven Adjustable2F08 12LithographyPäivikki RepoVille VähänissiMemmertMemmert Aalto Nanofab
View Oven Despatch1G 02AnnealingJaana Marles Despatch IndustriesLCC/D1-51N-3 Microelectronic Systems
View Oven Memmert 2L1019 12AnnealingVille Jokinen Memmertnn Aalto Nanofab
View Oven11MP 07AnnealingHarri Pohjonen Carbolite. Microelectronic Systems
View Oven21MP 08AnnealingHarri Pohjonen Memmert. Microelectronic Systems
View Oven31MP 09AnnealingHarri Pohjonen Poweta. Microelectronic Systems
View Oxidation 32F07 01CFurnace ProcessesPäivikki RepoVille VähänissiCentrothermCentrotherm Aalto Nanofab
View Oxidation 12F07 01AFurnace ProcessesVille VähänissiPäivikki RepoCentrothermCentrotherm Aalto Nanofab
View Oxidation 22F07 01BFurnace ProcessesPäivikki RepoVille VähänissiCentrothermCentrotherm Aalto Nanofab
View Oxidation 42F07 01DFurnace ProcessesPäivikki RepoVille VähänissiCentrothermCentrotherm Aalto Nanofab
View Oxidation furnace PEO-6031D 04Furnace ProcessesAntti Tolkki ATVPEO-603 Microelectronic Systems
View Oxide etcher LAM45201B 03Dry etchingFeng GaoPaula KettulaLAM/Point 35LAM 4520 Microelectronic Systems
View Oxide ICP etcher STS AOE1F10 03Dry etchingFeng Gao STSAOE Microelectronic Systems
View Parameter Analyzer Reedholm1F06 12CharacterizationAri Häärä Reedholm. Microelectronic Systems
View Parylene spray deposition tool1H06 04Other processesSanna Arpiainen SCS CoatingPSD 2010 Labcoater2 Microelectronic Systems
View PECVD Oxford Plasmalab1001F04 11CVD & ALDPaula Kettula OxfordPlasmalab100 Microelectronic Systems
View PECVD Oxford PlasmaPro System 1001B 18CVD & ALDPaula Kettula OxfordPlasmapro System 100 Microelectronic Systems
View PECVD Plasmalab F102F10 07CVD & ALDVictor OvchinnikovPäivikki RepoOxford InstrumentsPlasmalab 80Plus Oxford Instruments Aalto Nanofab
View Plasma Stripper1B 19Dry etchingJames Dekker Alpha Plasma Q240 Microsystems and nanoelectronics
View Plasma stripper 1 PRS8011B 10Other processesJames Dekker Plasma TechnologyPRS 801 Microelectronic Systems
View Plasma stripper PRS9001F10 06Other processesLeif Grönberg Oxford InstrumentsPRS900 Microelectronic Systems
View Plating work bench1F05 28Electrochemical DepositionHarri Ilmari Plast ServicePlast Service Microelectronic Systems
View Polysilicon etcher LAM44201B 04Dry etchingFeng GaoPaula KettulaLAM/Point 35LAM 4420 Microelectronic Systems
View Prime Oven HMDS2F08 24 LithographyPäivikki RepoVille VähänissiYESYES-3 Aalto Nanofab
View Primer oven YES-31A 11LithographyOlga Mihailichenco Yield EngineeringYES-3 Microelectronic Systems
View Primer oven YES-51G 14LithographyLeif Grönberg Yield EngineeringYES-5 Microelectronic Systems
View Probe station Cascade1F06 01CharacterizationAri Häärä Cascade . Microelectronic Systems
View Probe Station PA-1501S05 01CharacterizationJaakko Salonen Suss MicrotecPA 150 Microelectronic Systems
View Probestation2L4142 03Back-end ProcessesRamesh Raju Süss? Electron Physics Group
View Profilometer Bruker DektakXT1E 19CharacterizationStefan Mertin BrukerDektakXT VTT Nanofabrication Centre
View Profilometer Dektak/XT2F10 14CharacterizationJoonas Heikkinen BrukerNN Aalto Nanofab
View Profilometer Veeco Dektak M61E 14CharacterizationAri Häärä Veeco Dektak M6 Microelectronic Systems
View Profilometer Veeco Dektak V200Si1F06 04CharacterizationLeif Grönberg Veeco DektakV200Si Microelectronic Systems
View QuickSun2L4142 12CharacterizationIris Mack Endeas120CA Electron Physics Group
View RCA 22F11 16Wet ProcessesPäivikki RepoVille VähänissiPM PlastNN Aalto Nanofab
View Reflectometer 2000M-NIR1B 21CharacterizationAntti Tolkki SCI2000M-NIR88VTT Nanofabrication Centre
View Reflectometer FilmTek 2000M1D 12CharacterizationAntti Tolkki Scientific Computing Int.FilmTek 2000M Microelectronic Systems
View Reflectometer Nanospec1ST 12CharacterizationAntti Tolkki Nanometrics IncorporatedNanospec AFT 4150 Microelectronic Systems
View Reflectometer Opton2F11 11CharacterizationVictor Ovchinnikov OPTONOPTON Axiospeed Aalto Nanofab
View Reflow oven ATV1F05 01AnnealingJaakko Salonen ATVSRO_704_R Microelectronic Systems
View Rena Cu plating A1F05 24Electrochemical DepositionJaana Marles RENA. Microelectronic Systems
View Rena Cu plating B1F05 25Electrochemical DepositionHarri Ilmari RENA. Microelectronic Systems
View Rena Ni plating1F05 26Electrochemical DepositionJaana Marles RENA. Microelectronic Systems
View Rena SnPb plating1F05 27Electrochemical DepositionJaana Marles RENA. Microelectronic Systems
View Resist oven 11A 13LithographyJukka Huhtala MemmertUFE400 Microelectronic Systems
View Resist oven 21A 14LithographyJukka Huhtala MemmertUFE400 Microelectronic Systems
View Resist oven 31A 15LithographyJukka Huhtala MemmertUFE400 Microelectronic Systems
View Resist oven LOWER (5)1G 16LithographyLeif Grönberg MemmertUFE 400 Microelectronic Systems
View Resist oven LOWER (7)1F03 08AnnealingAndrey Shchepetov MemmertUFE 400 Microelectronic Systems
View Resist oven UPPER (4)1G 15LithographyLeif Grönberg MemmertUFE 400 Microelectronic Systems
View Resist oven UPPER (6)1F03 07LithographyAndrey Shchepetov MemmertUFE 400 Microelectronic Systems
View Resist Station Gamma41G 07LithographySami Ylinen Suss MicroTecGamma 4 Microelectronic Systems
View Resist track1F08 06LithographyPasi Haapasalo ConvacM6000 Microelectronic Systems
View Resist/developer track AIO1A 10LithographyOlga Mihailichenco AIODuna700  Microelectronic Systems
View Resist/Polymer Track Convac1G 01LithographyJaana Marles ConvacM6000 Microelectronic Systems
View RIE Oxford 80Plus1F04 08Dry etchingLeif Grönberg Oxford80 PLUS RIE Microelectronic Systems
View RIE Plasmalab F102F10 05Dry etchingVictor OvchinnikovChristoffer Joonas KauppinenOxford InstrumentsPlasmalab 80Plus Oxford Instruments Aalto Nanofab
View Rinse Dryer 1002F12 25Wet ProcessesPäivikki Repo Semitool2 stock Aalto Nanofab
View Rinse Dryer 1502F12 24Wet ProcessesPäivikki Repo Semitoolnn Aalto Nanofab
View Rinse Dryer 4-62F07 10Other processesPäivikki Repo Semitool870S Aalto Nanofab
View Rinse Dryer 4-62F08 22Other processesPäivikki Repo Semitool870S Aalto Nanofab
View Rinse Dryer Square2F08 23Other processesPäivikki Repo Semitool870S Aalto Nanofab
View Rinse Dryer Square2F07 11Other processesPäivikki Repo Semitool870S Aalto Nanofab
View Rinse Dryer Verteq 1002F11 15Wet ProcessesPäivikki Repo Verteqnn Aalto Nanofab
View Rinse Dryer Verteq 1502F11 14Wet ProcessesPäivikki Repo Verteq2 stock Aalto Nanofab
View RTA2L1020 01AnnealingVictor Ovchinnikov RussiaFoton-6 Aalto Nanofab
View RTP Jipelec2F12 09AnnealingVille Rontu JipelecJipelec Aalto Nanofab
View SAM Acoustic microscope1E 07CharacterizationPanu Pekko SonixHS3000 Microelectronic Systems
View SEM EBL Zeiss Supra 402F13 07CharacterizationOlivier MailletLibin WangZeissZeiss Supra 40 Aalto Nanofab
View SEM Tabletop 2L4142 02CharacterizationTaneli Juntunen HitachiHitachi TM-1000 Aalto Nanofab
View SEM Zeiss Supra 351F13 03CharacterizationStefan Mertin ZeissSupra35 Microelectronic Systems
View SEM/EDX/e-beam1A 05CharacterizationStefan Mertin ZeissLEO1560 Microelectronic Systems
View Semiconductor Parameter Analyzer1F06 08CharacterizationAri Häärä Agilent4155C Microelectronic Systems
View Silicon ICP etcher (Aviza)1B 01Dry etchingPanu Pekko AvizaOmega i2l Microelectronic Systems
View Silicon ICP etcher (STS)1F10 02Dry etchingFeng Gao STSASE Microelectronic Systems
View Single Wafer Dryer2F08 15Wet ProcessesPäivikki RepoVille VähänissiSingle Wafer DryerSingle Wafer Dryer Aalto Nanofab
View Sink Neutralization2F08 25 Wet ProcessesPäivikki RepoVille VähänissiPM PlastX Aalto Nanofab
View Sink Solvent2F08 26 Wet ProcessesPäivikki RepoVille VähänissiPM PlastX Aalto Nanofab
View Sinton Lifetime2F13 17CharacterizationMarko Yli-KoskiMichael Dov SeruéSinton InstrumentsWCT-120 & Suns-Voc Electron Physics Group
View Small LED lamp2L4196 09CharacterizationMichael Dov SeruéMarko Yli-Koski-- Electron Physics Group
View Sn plating Module1F05 11Electrochemical DepositionJaana Marles PM Plast . Microelectronic Systems
View SnAg plating module1F05 09Electrochemical DepositionJaana Marles PM Plast . Microelectronic Systems
View SNOM/NSOM WITec alpha3002L4166 01 SNOMCharacterizationCamilla TossiLassi HällströmWITecalpha 300 Micro and Quantum Systems
View Spectroscopic Ellipsometer2F13 14CharacterizationVictor Ovchinnikov NNNN Aalto Nanofab
View Spin Etcher1ST 10Wet ProcessesJaakko Salonen OptiwetSB30 Microelectronic Systems
View Spin rinse drier 1 (150 mm)1A 19Wet ProcessesRiitta Lindman VerteqSuperclean 1600-44 Microelectronic Systems
View Spin Rinse Drier 18 (150 mm)1ST 06Wet ProcessesJukka Nurminen SemitoolSRD 880S Microelectronic Systems
View Spin rinse drier 2 (150 mm)1A 20Wet ProcessesRiitta Lindman VerteqSuperclean 1600-34 Microelectronic Systems
View Spin Rinse Drier 201G 04Wet ProcessesHarri Ilmari VerteqSuperclean 1600-34 Microelectronic Systems
View Spin rinse drier 5 (100 mm)1C 12Wet ProcessesKirsi Järvi VerteqSuperclean 1600-34 Microelectronic Systems
View Spin rinse drier 6 (150 mm)1C 13Wet ProcessesKirsi Järvi VerteqSuperclean 1600-34 Microelectronic Systems
View Spin/Rinse Dryer 11 (100 mm)1F02 03Wet ProcessesMervi Vehviläinen VerteqSuperclean 1600/55M Microelectronic Systems
View Spin/Rinse Dryer 12 (150 mm)1F02 07Wet ProcessesMervi Vehviläinen VerteqSuperclean 1600-34 Microelectronic Systems
View Spin/Rinse Dryer 13 (100 mm)1F08 11Wet ProcessesEsa Tuovinen VerteqSuperclean 1600/55M Microelectronic Systems
View Spinner 8 inch1F05 21Wet ProcessesHarri Ilmari LaurellEDC1-100-8NPP/IND Microelectronic Systems
View Spinner BLE2F08 17LithographyPäivikki RepoVille VähänissiBLEBLE Aalto Nanofab
View Spinner Cu2F11 17 Wet ProcessesMarko Yli-KoskiHele SavinLaurellNN Electron Physics Group
View Spinner I2F03 11LithographyJoonas PeltonenAntti PeltonenLaurellNN Nanomagnetism and Spintronics Group
View Spinner II2F03 12LithographyJoonas PeltonenAntti PeltonenLaurellNN Nanomagnetism and Spintronics Group
View Spinner Laurell 2F08 27LithographyPäivikki RepoVille JokinenLaurellWS-650MZ-23NPPB50Aalto Nanofab
View Spinner Lithography2L1019 38 LithographyPäivikki RepoVille VähänissiLaurellNN Microfabrication Group
View Sputter Chromium2L1019 28 SputteringVesa VuorinenGlenn RossEmitechK575X404Electronic reliability and integration
View Sputter Gold2L1019 19SputteringVictor Ovchinnikov OPTONOPTON Aalto Nanofab
View Sputter Plasmalab F102F10 04SputteringVictor Ovchinnikov Oxford InstrumentsPlasmalab 400, Oxford Instruments Aalto Nanofab
View Sputter Sloan1KP 05SputteringJukka Lappeteläinen SloanJoSa Microelectronic Systems
View Sputtering system Mark IV1F04 01SputteringLeif Grönberg TELMark Eclipse IV Microelectronic Systems
View Sputtering system 1 PV-LLS8011E 01SputteringAntti Tolkki ProvacPV-LLS801 Microelectronic Systems
View Sputtering system MRC1F04 09SputteringLeif Grönberg MRC903 Microelectronic Systems
View Sputtering system VA1F04 04SputteringStefan MertinUnto SuominenVonArdenneCS 730 S Cluster System Microelectronic Systems
View SPV Scanner2L4142 05CharacterizationVille VähänissiMarko Yli-KoskiSemilabWT85XL-400 Electron Physics Group
View SQUID-evaporator1TF 06EvaporationLeif Grönberg Josa Josa Microelectronic Systems
View Stereo Microscope F10B2F10 09CharacterizationAntti Peltonen nnnn Nanomagnetism and Spintronics Group
View Struers Grinding LaboPol-212L1019 26 Back-end ProcessesVesa Vuorinen StruersLaboPol-21 Electronic reliability and integration
View Struers Polishing RotoPol-222L1019 27 Back-end ProcessesVesa Vuorinen StruersRotoPol-22 Electronic reliability and integration
View Suns-Voc2L4196 10CharacterizationVille Vähänissi SintonVOC-0246 Electron Physics Group
View Suntest XLS2L4142 08CharacterizationMarko Yli-KoskiMichael Dov SeruéAtlas Material Testing SolutionsSuntest XLS+ Electron Physics Group
View Temperature dependent Sinton Lifetime2L4196 03CharacterizationMarko Yli-KoskiMichael Dov SeruéSinton InstrumentsWCT-120TS Electron Physics Group
View TePla 4002L1019 20Other processesElmeri ÖsterlundGlenn RossPVA TEPLA400 Plasma System Electronics Integration and Reliability
View Test_tool_MkoXXXXXXXXNanostructuringMika Koskenvuori RandomRandom  Physical Characteristics of Surfaces and Interface
View Thin Film Lab2L1019Other processesMika Koskenvuori NNNN Nanomagnetism and Spintronics Group
View TMAH etch2F12 11Wet ProcessesPäivikki RepoPekka TörmäNNNN Aalto Nanofab
View Ultrasonic Bath2F12 04Wet ProcessesPäivikki Repo nnnn Aalto Nanofab
View UV Lamp System2L1019 16CharacterizationVille Jokinen DYMAXECE 2000 Microfabrication Group
View UV photostabilizer1B 06Other processesSami Ylinen FusionM150PC Microelectronic Systems
View UV-Lamp Visual Inspection2F09 10Other processesPäivikki RepoVille Vähänissinnnn Aalto Nanofab
View UV-NIL (accessory for Mauri Antero)2F08 01BLithographyNagarajan Subramaniyam SussSuss MA-6 Aalto Nanofab
View Vacuum Furnace1TF 05AnnealingJaakko Saarilahti Thermco . Microelectronic Systems
View Vacuum Furnace Webb2L1019 21 AnnealingElmeri Österlund WebbRed Devil M Electronics Integration and Reliability
View Vacuum Oven1G 13LithographyLeif Grönberg Heraus Oven Microelectronic Systems
View Wafer backgrinder 7AF1ST 02Back-end ProcessesJaakko Salonen Strasbaugh7AF Microelectronic Systems
View Wafer Bonder AML2F11 08Wafer BondingVictor Ovchinnikov AML AML-AWB  Aalto Nanofab
View Wafer Bonder EVG 5101J 08Wafer BondingFeng Gao EVGEVG 510 Microelectronic Systems
View Wafer bonder EVG5201S1E 16Wafer BondingPanu Pekko Electronic VisionEVG5201S Microelectronic Systems
View Wafer Defect Inspection System1E 13CharacterizationAntti Tolkki NanoPhotonicsReflex TT Microelectronic Systems
View Wafer spinner POLOS1G 22LithographyLeif Grönberg SPSMCD200 NPP Microelectronic Systems
View Wafer Stepper FPA 3000-i41A 04LithographyOlga Mihailichenco CanonFPA 3000-i4711Microelectronic Systems
View Wafer Taper1G 19Other processesHarri Pohjonen Longhill Industries LTDLH836 Microelectronic Systems
View Vector Network Analyzer1F06 07CharacterizationAri Häärä Anritsu. Microelectronic Systems
View Wet Bench F11A2F11 06Wet ProcessesPäivikki RepoVille VähänissiStanglStangl 26Aalto Nanofab
View Wet Bench MIXED ETCHANTS1F02 04Wet ProcessesHarri Ilmari Stangl ME Microelectronic Systems
View Wet Bench PRE-CLEAN2F12 06Wet ProcessesPäivikki RepoHarri PaasinummiPMPlast old VTT wet bench Aalto Nanofab
View Wet Bench RCA 1-22F07 08Wet ProcessesPäivikki RepoVille VähänissiStanglAcid Aalto Nanofab
View Wet Bench BCB1G 03Wet ProcessesJaana Marles Semitool WB Microelectronic Systems
View Wet bench D CLEAN 11D 07Wet ProcessesHarri Ilmari Stangl Stangl07 Microelectronic Systems
View Wet bench D CLEAN 21D 09Wet ProcessesHarri Ilmari Stangl Stangl Microelectronic Systems
View Wet Bench DCLEAN 31D 10Wet ProcessesHarri Ilmari Stangl Singulus- Microelectronic Systems
View Wet bench DEVELOP 21G 23Wet ProcessesHarri Ilmari StanglWB Microelectronic Systems
View Wet Bench Development2F08 10AWet ProcessesPäivikki RepoVille VähänissiStanglAcid321Aalto Nanofab
View Wet bench HF 11C 04Wet ProcessesHarri Ilmari Stangl Stangl Microelectronic Systems
View Wet bench HF 21C 05Wet ProcessesHarri Ilmari Stangl Stangl Microelectronic Systems
View Wet bench Hot plates2F08 18LithographyPäivikki RepoVille VähänissiPMPlastPMPlast Aalto Nanofab
View Wet Bench MASK CLEAN1F03 16Wet ProcessesHarri Ilmari StanglMask Clean Microelectronic Systems
View Wet bench METAL ETCH1C 08Wet ProcessesHarri Ilmari Stangl Stangl Microelectronic Systems
View Wet Bench Oxide Etch2F08 10BWet ProcessesPäivikki RepoVille VähänissiStanglnn Aalto Nanofab
View Wet bench Piranha2F08 10CWet ProcessesPäivikki RepoVille VähänissiStanglNA Aalto Nanofab
View Wet bench PIRANHA1C 16Wet ProcessesHarri Ilmari Stangl Stangl Microelectronic Systems
View Wet Bench POLYMERS1F03 05Wet ProcessesJoonas Peltonen Stangl Polymers Microelectronic Systems
View Wet bench POSISTRIP 11C 10Wet ProcessesHarri Ilmari StanglStangl Microelectronic Systems
View Wet bench POSISTRIP 21C 11Wet ProcessesHarri Ilmari Stangl Stangl Microelectronic Systems
View Wet bench POST CMP1ST 05Wet ProcessesJaakko Salonen SSE/Arias. Microelectronic Systems
View Wet bench Resist Removal2F08 09Wet ProcessesPäivikki RepoVille VähänissiStanglSolvent Aalto Nanofab
View Wet bench RINSE1D 08Wet ProcessesHarri Ilmari Plast Service Rinse module Microelectronic Systems
View Wet bench RINSE 11F02 06Wet ProcessesHarri Ilmari Stangl RINSE Microelectronic Systems
View Wet bench RINSE 21F03 04Wet ProcessesJoonas Peltonen Stangl Rinse Microelectronic Systems
View Wet bench SOLVENTS1A 22Wet ProcessesHarri Ilmari Stangl - Microelectronic Systems
View Wet Bench spinner2F08 16LithographyPäivikki RepoVille VähänissiStanglWet Bench with Spinner Aalto Nanofab
View Wet bench STANDARD ETCHANTS1F02 02Wet ProcessesHarri Ilmari Stangl SE Microelectronic Systems
View Wire bonder1MP 03Back-end ProcessesHarri Pohjonen F&K DelvotecDelvotec 5430  Microelectronic Systems
View Wire bonder Delvotec 532L4142 01Back-end ProcessesShilpi SinghAzat GubaydullinDelvotec 53Delvotec 53BDA Aalto Nanofab
View Wire Bonder Delvotec 53XX2L4142 09Back-end ProcessesShilpi SinghAzat GubaydullinDelvotec53XX PICO
View XeF2 Etcher1E 18Dry etchingJaakko Saarilahti SPTSXactix Microelectronic Systems
View Xenon lamp2L4196 06CharacterizationVille Vähänissi Micronova- Electron Physics Group
View XRD Panalytical2L4168 02CharacterizationSami SuihkonenJori LemettinenPanalyticalNN Nanotechnology Group
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