Picture of Rinse Dryer 4-6
Current status:
AVAILABLE
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2nd Responsible:
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Rinse & Drier for 100 mm and 150 mm wafers

- For wafers processed in 2F08 09-10 Wet Bench litho, oxide etch and piranha and 2F11 06 Wet Bench F11.

- Keep insert on the top of the Rise & Drier meanwhile processing 150 mm wafers.

- Begin with a dummy run Recipe 8 to rinse the tool after not being used. Use emtpy teflon casette during dummy run.

- For standard rinse & drying choose Recipe 1.

 

Tool name:
Rinse Dryer 4-6
Area/room:
M2 F8 Lithography
Category:
Other processes
Manufacturer:
Semitool
Model:
870S

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