Picture of Wet Bench Development
Current status:
AVAILABLE
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1st Responsible:
2nd Responsible:
Process:
Paula Kettula
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Compulsory to mark all solution changes in PESO

Allowed materials : Semiconductors wafers and chips, glass, Al, Ti, W, Cr

Forbidden materials : All other metals

Tool name:
Wet Bench Development
Area/room:
M2 F8 Lithography
Category:
Wet Processes
Manufacturer:
Stangl
Model:
Acid

Approved use : Resist  development

Instructors

Licensed Users

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