Picture of Rinse Dryer Verteq 100
Current status:
AVAILABLE
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2nd Responsible:
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Use of this spin rinse/dryer (SRD) is binded to RCA cleaning of silicon wafers any other use is not possible

Upper SRD for 150mm wafers

lower SRD for 100 mm wafers

N2 flow is not big enough that you could use both Verteq rinse dryers simultaneously.

Alarm for too small N2 flow   is HELP 0002. Reset by pressing STOP-START.

Tool name:
Rinse Dryer Verteq 100
Area/room:
M2 F11 Wafers
Category:
Wet Processes
Manufacturer:
Verteq
Model:
nn

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