Picture of Wet Bench spinner
Current status:
AVAILABLE
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1st Responsible:
2nd Responsible:
Process:
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Approved use : Spinning of photoresist

Approved materials : Semiconductor wafers and chips, Glass wafers

Tool name:
Wet Bench spinner
Area/room:
M2 F8 Lithography
Category:
Lithography
Manufacturer:
Stangl
Model:
Wet Bench with Spinner

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