A basic binocular optical microscope for a quick test of development step during the lithography process. Can be used also for checking the patterns on the photo-mask.
Key Features and Accessories:
Instrument contains a carousel with three objectives (Leitz Wetzlar) with x10, x20, and x50 magnification. A yellow light filter is attached in order to protect the photoresist layer from over-exposure during the inspection.
Key Specifications:
| Resolution |
2 mm – 2 μm |
| Table movement in X-Y directions |
± 5 cm |
Substrate Size:
Up to 200mm (smaller pieces possible)
Allowed Materials:
All solid materials allowed in a cleanroom
Forbidden Materials:
Soft sticky samples