Picture of TePla 400
Current status:
AVAILABLE
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1st Responsible:
2nd Responsible:
Process:
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Remote microwave plasma for surface activation, cleaning and polymer etching, for example. Maximum plasma power is 1 000 W and available process gasses are argon and oxygen.

No liquids or sticky substances, nor samples that cannot whitstand vacuum.

Tool name:
TePla 400
Area/room:
Lab 1019 Thin Film
Category:
Other processes
Manufacturer:
PVA TEPLA
Model:
400 Plasma System

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