Picture of Evaporator LISA
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AVAILABLE
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Electron beam evaporator: used for high resolution nanofabrication with a special focus on depositing metal films (superconductors  and normal metals) for lift off techniques.

  • 6-pocket revolver-type evaporation source with standard materials (Al, Ti, Ag, Cu), tool with limited choice of materials, mainly for tunnel junction fabrication
  • plasma gun for substrate cleaning / etching, can be run with Ar or O2 turbo pump only
  • sample holder with manually adjustable tilt
  • oxidation with pure oxygen or oxygen/argon mixture up to 200 mbar in loading chamber
  • minimum pump time before film deposition 1 hour
  • crystal thickness monitor
  • typical film thickness 2 to 40 nm, maximum 100 nm, on special request up to 300 nm
  • evaporation rate 0.2 Å/s up to 5 Å/s
  • substrate size from small pieces to 4" wafer
  • automated pump-down sequence, operating pressure 10-8 mbar
Tool name:
Evaporator LISA
Area/room:
M2 S9
Category:
Evaporation
Manufacturer:
Instrumentti Mattila
Model:
IM-9912

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