Picture of Furnace MiniBrute Upper
Current status:
WARNING
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1st Responsible:
2nd Responsible:
Process:
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Key Specifications:

• Temperature range 400-1200°C
• N2, O2  annealing options

Substrate Size:

Max -100 mm dia. Smaller samples are loaded on dummy wafer.

Allowed Materials: Si, some metals, oxides.

Forbidden Materials:

Elements with the high vapor pressure at the room temperature (Pb,Zn,Cd, V-VI group), organic.

Tool name:
Furnace MiniBrute Upper
Area/room:
Lab 1020 MBE
Category:
Furnace Processes
Manufacturer:
Mini-Brute
Model:
Mini-Brute

Instructors

Licensed Users

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