Picture of ALD Reactor ALD-2
Current status:
AVAILABLE
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License and training

The tool training is given on the 3rd Tuesday of every month, at 09:00. The deadline for registering for the training is the previous Friday. Contact the main users to confirm your participation. In registering for the training, please provide the following details:

  • Substrate material
  • List of all the materials currently on the substrate (metals etc.)
  • Film to be deposited (Al2O3, HfO2, …)
  • Film thickness
  • Process temperature
  • One-sided or double-sided deposition

 

Description:

ALD equipments are designed to the oxide and nitride film deposition. In Micronova there is two ALD equipments (ALD1 (PEALD capable) and ALD2) in the clean room finger F9. The equipments are build on same frame but accessories are different. Both equipments are in common use. Micronova ALDs are mainly used to grow

  • ICP-RIE etch stop layers (Al2O3)
  • Insulating layers (Al2O3, HfO2)
  • Optical thin film applications as filter structures (TiO2, Al2O3,ZnO)
  • Novel materials and applications (Ta2O5,TiN,TaN, MoO3
  • Rare-earth oxides (Er2O3, Yb2O3, Tm2O3, La2O3)

Key Features and Accessories:

ALD2

  • Liquid precursors: H2O, TMA , TiCl4, HfCl4, DEZn, DMACl
  • Solid precursors: TaCl5, TDMAHf, La(TMHD)3, Er(TMHD)3, Yb(TMHD)3, Tm(TMHD)3, Mo(CO)6
  • Three precursor gases: NH3, O2 and O3
  • Nitrogen as the carrier gas
  • Two heated precursor containers: HS-300 and HS-500
  • Operating temperature from 20 to 450 °C
  • Water cooling

Key Specifications

  • Maximum wafer size 200 mm
  • Substrate Size:
  • Sample size < 200 mm wafer. Also thicker samples can be coated up to 15 mm thickness with lifting ring.

Allowed Materials:

  • Si
  • Compound semiconductors (such as GaN, InP, GaAs)
  • Polymers (such as SU-8, AZ-resists, PMMA)
  • Some metals such as (Al, Cr, Ge, Ti) 
  • Glasses (such as soda lime glass)

Forbidden Materials:

  • Noble metals (such as Au, Ag, Pt, Cu, Pd) 
  • Heavy metals (such as Cd, Pb, Zn)
  • Clean room incompatible materials (such as silicones, wood, paper etc.)
Tool name:
ALD Reactor ALD-2
Area/room:
M2 F9 ALD
Category:
CVD & ALD
Manufacturer:
Beneq
Model:
Beneq TFS-500

Instructors

Licensed Users

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