Picture of Wet Bench  F11A
Current status:
AVAILABLE
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1st Responsible:
2nd Responsible:
Process:
Marko Yli-Koski
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RCA I cleaning for Si and Pyrex

Allowed materials : Silicon wafers

Forbidden materials : Metals

Tool name:
Wet Bench F11A
Area/room:
M2 F11 Wafers
Category:
Wet Processes
Manufacturer:
Stangl
Model:
Stangl

Instructors

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