Picture of Wafer Stepper FPA 3000-i4
Current status:
AVAILABLE
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1st Responsible:
2nd Responsible:
Process:
Olga Mihailichenco
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Wafer stepper is used for exposure of 150 mm and 200 mm wafers. Resolution 0.35 μm, 5:1 reduction image, total field size on reticle 20 mm x 20 mm, alignment accuracy <100 nm (with Vernier patterns). More details can be found in ‘FPA-3000i4 - Standard Specification.pdf’ in folder ‘P:\Prosessilaitteet M1\(A) Lithography\A23 Wafer Stepper Canon i4\A. General information’

Tool name:
Wafer Stepper FPA 3000-i4
Area/room:
M1 A Lithography
Category:
Lithography
Manufacturer:
Canon
Model:
FPA 3000-i4

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