Picture of Ellipsometer Plasmos
Current status:
AVAILABLE
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The system for measurement of optical parameters and thickness of transparent layers on reflective substrate. Manual sample loading and computer assisted measurement and calculations.

Key Features and Accessories:

The system works using rotating analyzer method to measure ellipsometric angles Ψ and Δ at the fixed wavelength. The obtained Ψ and Δ are compared with result of simulation to calculate film thickness and refractive index. A sample must have flat and mirror-like surface, covered by transparent layers. The system has a He-Ne laser as a light source.
 

Key Specifications:

Laser wavelength 632.8 nm
Time of measurement under 1 s/point
Incidence angle range 35 - 73 °
Number of analyzed layers up to 5
Thickness error for SiO2 film < 0.6 nm (fixed refractive index)

Substrate Size:

Up to 145 mm

Allowed Materials:

Solid substrates

Forbidden Materials:

Sticky, powder and liquid materials

 

Tool name:
Ellipsometer Plasmos
Area/room:
M2 F9 ALD
Category:
Characterization
Manufacturer:
Plasmos
Model:
Plasmos SD2300

Instructors

Licensed Users

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