Picture of ASM LPCVD Nitride
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ASM vertical low-pressure chemical vapor deposition (LPCVD) furnace is used for thin film deposition on front-end materials on B-class silicon or transparent wafers. The process is stoichiometric and low-stress nitride (LSN).

Tool name:
ASM LPCVD Nitride
Area/room:
M1 D Diffusion
Category:
CVD & ALD
Manufacturer:
ASM
Model:
DUO A400

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