Picture of FIB Helios
Current status:
AVAILABLE
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1st Responsible:
2nd Responsible:
Process:
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Dual Focused Beam system

 

 

BEAM COLUMNS:

-Ga-ion

-electron, 30kV  ELSTAR FEG

 

GAS INJECTION:

-Pt (Trimethyl-1Methyl2,4-Cyclopentadien-1-YL-Platinum)

-W (TungstenHexaCarbonyl)

-Insulator/TEOS (Ethylsilicate)

-Delineation Etch (Trifluoroacedtamide)

 

ANALYSIS:

-SE, BSE, STEM

-EDX (EDAX)

Tool name:
FIB Helios
Area/room:
M2 F13 Analysis Lab
Category:
Nanostructuring
Manufacturer:
FEI
Model:
Helios Nanolab600

Instructors

Licensed Users

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