Picture of Wet bench Piranha
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AVAILABLE
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Piranha (Sulphuric acid:hydrogenperoxide 4:1)

Usage: Mask cleaning, very hard baked resist residue cleaning

Approved material : Silicon but no Si wafers on metals

No Metals except Cr on glass masks

Tool name:
Wet bench Piranha
Area/room:
M2 F8 Lithography
Category:
Wet Processes
Manufacturer:
Stangl
Model:
NA

Pirahna etch of silicon and glass masks.

Removes organic contamination

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