Picture of Oxidation 2
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1st Responsible:
2nd Responsible:
Process:
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Substrate Size: 100mm and 150mm.

Allowed Materials: Tube 1: Metallized silicon, SiN, SiO
                              Tube 2 and tube 3: Clean Silicon

Forbidden Materials: Substrates: everything other than silicon (except tube 1)

Tubes in oxidation stack:

  • OX4
  • OX3
  • OX2
  • OX1

Gases N2, O2, H2, Bubbler TRANS-LC (trans 1,2-Dichloroethen)

 

Tool name:
Oxidation 2
Area/room:
M2 F7 Furnace
Category:
Furnace Processes
Manufacturer:
Centrotherm
Model:
Centrotherm

Instructors

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