Picture of Oven 120
Current status:
AVAILABLE
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Ovens for photoresist baking during lithography processes. “Hard bake” oven is kept permanently at 120ºC and “Soft bake” oven at 95ºC. “Programmable” oven can be used at temperatures up to 220ºC.

Key Specifications:

Chamber size UE 500 560x480x400mm
Chamber size UP 400 400x400x330
Number of shelves 2 each
Tool name:
Oven 120
Area/room:
M2 F8 Lithography
Category:
Lithography
Manufacturer:
Memmert
Model:
Memmert

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