Picture of Manual spinner LSM200
Current status:
AVAILABLE
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Description:

Photoresist coating equipment for silicon and quartz wafers.

Key Features and Accessories:

Option for automated resist dispense and EBR. Max. substrate size 150 mm. 

Key Specifications:

Spin speed up to 6000 RPM. Controller for 10 recipes with 24 steps in each.

Substrate Size:

150 mm

Allowed Materials:

Silicon and quartz wafers. IC-compatible metals.

Forbidden Materials:

Non-IC materials

Availability and Cost:

Availability: F
Cost: High

Tool name:
Manual spinner LSM200
Area/room:
M1 A Lithography
Category:
Lithography
Manufacturer:
Sawatec
Model:
LSM 200

Instructors

Licensed Users

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