UV and thermal nanoimprint machine operating in step & repeat mode. Sub 100 nm resolution.
Process Conditions and Specifications
Stamp and substrate heating range from RT to 450 ºC. Max force 140 N. Substrate size up 200 mm, stamp size up to 50 mm.
Semiconductor compatible materials, plastics , polymers.
Gases and Chemicals
Compressed air, nitrogen.
Beware UV-radiation, hot surfaces, moving parts
Operation under yellow light due to UV-sensitive materials