Brief Description

UV and thermal nanoimprint machine operating in step & repeat mode. Sub 100 nm resolution.

Process Conditions and Specifications

Stamp and substrate heating range from RT to 450 ºC. Max force 140 N. Substrate size up 200 mm, stamp size up to 50 mm.

Allowed Materials

Semiconductor compatible materials, plastics , polymers.

Gases and Chemicals

Compressed air, nitrogen.

Safety

Beware UV-radiation, hot surfaces, moving parts

Special Requirements

Operation under yellow light due to UV-sensitive materials