Picture of Ion Beam Etcher
Current status:
AVAILABLE
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The tool for dry etching of thin films by Ar ions.

Maximum film thickness is 200 nm.

Ion energy range 300 - 1500 eV, ion curren dentsity is around 0.6 mA/cm2.

Tool name:
Ion Beam Etcher
Area/room:
M2 F11 Wafers
Category:
Dry etching
Manufacturer:
Meyer Burger
Model:
IonSys 500

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