Picture of Evaporator e-gun Varian
Current status:
AVAILABLE
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2nd Responsible:
Process:
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Substrate Size: 100 mm dia. Max. Holders for smaller samples are available.

Forbidden Materials:

Elements with the high vapor pressure at the room temperature (Pb,Zn,Cd V-VI group), organic.

Electron beam evaporator for nanoscale (metal) thin film deposition. Typical thickness 20-200 nm.

  • Holds up to 4 evaporation source crucibles with standard materials (Al,Ti,Ag,Cu, Au, AuPd,Ge, Cr …).
  • Tilt and rotation of stage (either or)
  • Oxidation with pure oxygen
  • Minimum pump time before film deposition 1.5 hours
  • Crystal thickness monitor
  • Evaporation rate up to 5 Å/s
  • Substrate size from small pieces to 4“ wafer
  • Operating pressure 1e-6 mbar
Tool name:
Evaporator e-gun Varian
Area/room:
Lab 1019 Thin Film
Category:
Evaporation
Manufacturer:
Varian
Model:
Varian (B 'n B)

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