Picture of ALD reactor SUNALE R-150B
Current status:
AVAILABLE
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1st Responsible:
2nd Responsible:
Process:
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  • ALD Al2O3, TiO2 and laminates thereof
  • Normal temperatures 110-300°C
  • Currently, use by VTT operators only
Tool name:
ALD reactor SUNALE R-150B
Area/room:
M1 B Plasma Etching
Category:
CVD & ALD
Manufacturer:
Picosun
Model:
SUNALE R-150B

Instructors

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