Picture of Diffusion furnace, A2 oxidation
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Centrotherm E1200 HT 260-4 1D 01 Diffusion furnace A-stack is used to process IC-clean silicon wafers either with reactive or inert gases. The main processes are dry and wet oxidation, diffusion, and annealing.

Tool name:
Diffusion furnace, A2 oxidation
Area/room:
M1 D Diffusion
Category:
Furnace Processes
Manufacturer:
Centrotherm
Model:
E1200 HT 260-4

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