A basic binocular optical microscope for a quick test of development step during the lithography process. Can be used also for checking the patterns on the photo-mask.
Key Features and Accessories:
Instrument contains a carousel with three objectives (Leitz Wetzlar) with x10, x20, and x50 magnification. A yellow light filter is attached in order to protect the photoresist layer from over-exposure during the inspection.
||2 mm – 2 μm
|Table movement in X-Y directions
||± 5 cm
Up to 200mm (smaller pieces possible)
All solid materials allowed in a cleanroom
Soft sticky samples