Picture of Wet Bench Oxide Etch
Current status:
AVAILABLE
Book | Log
Show/Collapse all

You must be logged in to view files.

Approved materials : Silicon wafers and chips

Forbidden materials : Metals

Tool name:
Wet Bench Oxide Etch
Area/room:
M2 F8 Lithography
Category:
Wet Processes
Manufacturer:
Stangl
Model:
nn

Approved use : Wet etching of Silicon dioxide using buffered HF

Instructors

Licensed Users

You must be logged in to view tool modes.