Rinse & Drier for 100 mm and 150 mm wafers
- For wafers processed in 2F08 09-10 Wet Bench litho, oxide etch and piranha and 2F11 06 Wet Bench F11.
- Keep insert on the top of the Rise & Drier meanwhile processing 150 mm wafers.
- Begin with a dummy run Recipe 8 to rinse the tool after not being used. Use emtpy teflon casette during dummy run.
- For standard rinse & drying choose Recipe 1.