Picture of Wafer Cleaner Batchspray Acid
Current status:
AVAILABLE
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~~• 1C24 WAFER CLEANER IS COMPATIBLE WITH 150 mm AND 200 mm CLASS B WAFERS
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• PRIMARY USE:
• - Particle removal
• - Post stripping cleaning
• - Plasmapolymer removal
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• STANDARD RECIPES:
• - RCA for common cleaning, particle removal
• - POLYMERS for removing organic- and or post ash residues
• - POLYMERS plus RCA for organic- and post ash removal INCLUDING HF dip for nativeSC1-oxide removal
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• - SUPER SC2 for removal of ionic contamination ( PENDING )
 

Tool name:
Wafer Cleaner Batchspray Acid
Area/room:
M1 C Wet Processes
Category:
Wet Processes
Manufacturer:
Siconnex
Model:
Batchspray acid 2.0

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