Picture of Evaporator Plassys
Current status:
AVAILABLE
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Ultra-high vacuum electron beam evaporator for deposition of high-purity Al thin films (e.g. for tunnel junctions).

  • Materials selections limited to Ti and Al (at least initially)
  • 8-pocket linear source with large materials capacity
  • 3 chambers separating sample loading, process and source functions
  • Ar gun for sample milling in the loading chamber
  • Oxidation (static & dynamic) using either needle valve or mass-flow controller in the process chamber (wide pressure range)
  • UV light for surface treatment in the process chamber
  • Sample stage heating up to 700 °C using special sample carrier (ONLY with separate main user permission!)
  • Sample stage cooling with liquid nitrogen (ONLY with separate main user permission - NOT installed yet!)
  • Fully automated operation with computer control (incl. sample transfer)
  • Closed-loop control of the evaporation rate via emission current (about 20% precision)
  • Evaporation rate currently limited to 2 Å/s for most processes
Tool name:
Evaporator Plassys
Area/room:
M2 S10
Category:
Evaporation
Manufacturer:
Plassys
Model:
MEB700S2-III UHV

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