Please notice that this is our old ellipsometer (2F09 04 Ellipsometer Plasmos) and that we have recently obtained a new one with much more features/options (2F09 05 Spectroscopic Ellipsometer SE-2000). If you do not have a specific reason to apply license for the old tool, please apply license for the new tool.
The system for measurement of optical parameters and thickness of transparent layers on reflective substrate. Manual sample loading and computer assisted measurement and calculations.
Key Features and Accessories:
The system works using rotating analyzer method to measure ellipsometric angles Ψ and Δ at the fixed wavelength. The obtained Ψ and Δ are compared with result of simulation to calculate film thickness and refractive index. A sample must have flat and mirror-like surface, covered by transparent layers. The system has a He-Ne laser as a light source.
Key Specifications:
| Laser wavelength |
632.8 nm |
| Time of measurement |
under 1 s/point |
| Incidence angle range |
35 - 73 ° |
| Number of analyzed layers |
up to 5 |
| Thickness error for SiO2 film |
< 0.6 nm (fixed refractive index) |
Substrate Size:
Up to 145 mm
Allowed Materials:
Solid substrates
Forbidden Materials:
Sticky, powder and liquid materials